EUV LITHOGRAPHY APPARATUS AND OPERATING METHOD FOR MITIGATING CONTAMINATION: abstract simplified (17717709)

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  • This abstract for appeared for patent application number 17717709 Titled 'EUV LITHOGRAPHY APPARATUS AND OPERATING METHOD FOR MITIGATING CONTAMINATION'

Simplified Explanation

The abstract describes an apparatus used in extreme ultra violet (EUV) lithography. It consists of a light source that produces EUV light, a scanner that receives the light and directs it to a reticle stage, and a debris catcher positioned along the EUV beam path. The debris catcher is made up of a network membrane containing numerous nano-fibers.


Original Abstract Submitted

An extreme ultra violet (EUV) lithography apparatus includes a light source that generates an EUV light beam, a scanner that receives the light from a junction with the light source and directs the light to a reticle stage, and a debris catcher disposed on a EUV beam path between the light source and the scanner. The debris catcher includes a network membrane including a plurality of nano-fibers.

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