Applied Materials, Inc. patent applications published on November 30th, 2023

Summary of the patent applications from Applied Materials, Inc. on November 30th, 2023

Applied Materials, Inc. has recently filed several patents related to various aspects of semiconductor device processing and manufacturing. These patents cover topics such as spin-orbit torque magnetoresistive random-access memory (SOT-MRAM) devices, OLED device processing, chemical mechanical polishing assemblies, substrate backside damage reduction, metal oxo photoresist deposition, selective metal removal, semiconductor processing using oxygen-containing and halide precursors, flowable silicon film for gap filling, cleaning bevel areas of substrate supports, and flow guides for semiconductor manufacturing.

Summary: - Applied Materials, Inc. has filed patents for spin-orbit torque magnetoresistive random-access memory (SOT-MRAM) devices and their manufacturing methods. - They have also filed patents for methods of processing OLED devices, including the formation of anode layers using metal oxide materials and protective barriers. - Patents have been filed for chemical mechanical polishing assemblies, including fluid delivery conduits with conductive wires for electrostatic discharge. - Applied Materials, Inc. has filed patents for reducing substrate backside damage during semiconductor device processing, including plasma preheat treatments and improved substrate support designs. - They have also filed patents for depositing metal oxo photoresist films using dry deposition processes, eliminating the need for wet chemical processes. - Patents have been filed for selectively removing metal material from feature surfaces and sidewalls, as well as for semiconductor processing using oxygen-containing and halide precursors. - Applied Materials, Inc. has filed patents for filling gaps within substrate features using flowable silicon films, cleaning bevel areas of substrate supports, and flow guides for deposition process adjustability in semiconductor manufacturing.

Notable Applications:

• SOT-MRAM devices and manufacturing methods.
• OLED device processing methods.
• Chemical mechanical polishing assemblies with electrostatic discharge capabilities.
• Substrate backside damage reduction during semiconductor processing.
• Metal oxo photoresist deposition using dry processes.
• Selective metal removal from feature surfaces and sidewalls.
• Semiconductor processing using oxygen-containing and halide precursors.
• Flowable silicon film for gap filling in substrate features.
• Cleaning bevel areas of substrate supports in plasma processing chambers.
• Flow guides for deposition process adjustability in semiconductor manufacturing.

Patent applications for Applied Materials, Inc. on November 30th, 2023

DETERMINATION OF SUBSTRATE LAYER THICKNESS WITH POLISHING PAD WEAR COMPENSATION (18365527)

Main Inventor

Kun Xu

OPERATION OF CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING (17968608)

Main Inventor

Steven M. Zuniga

CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING (17968597)

Main Inventor

Steven M. Zuniga

GROUNDING TECHNIQUES FOR ESD POLYMERIC FLUID LINES (17974280)

Main Inventor

Chad Pollard

MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS (18232421)

Main Inventor

Chandan Kr Barik

METHOD TO IMPROVE DISPLAY EFFICIENCY AND UNIFORMITY OF AR WAVEGUIDE (18143747)

Main Inventor

Jinxin FU

METHODS AND MECHANISMS FOR PREVENTING FLUCTUATION IN MACHINE-LEARNING MODEL PERFORMANCE (17824282)

Main Inventor

Jui-Che Lin

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DISTANCE (17827204)

Main Inventor

Tyler Wills

GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE (18303370)

Main Inventor

Frank Sinclair

PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY (17871455)

Main Inventor

Zhepeng CONG

PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY (17871505)

Main Inventor

Zhepeng CONG

SITU CLEAN FOR BEVEL AND EDGE RING (17829288)

Main Inventor

Kaushik ALAYAVALLI

LOW TEMPERATURE SILICON OXIDE GAP FILL (17827652)

Main Inventor

Soham Asrani

HIGHLY CONFORMAL METAL ETCH IN HIGH ASPECT RATIO SEMICONDUCTOR FEATURES (17827356)

Main Inventor

Xiaolin C. Chen

SELECTIVE METAL REMOVAL WITH FLOWABLE POLYMER (17824889)

Main Inventor

Liqi Wu

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS (18082872)

Main Inventor

Lakmal Charidu Kalutarage

METHODS AND APPARATUS FOR MINIMIZING SUBSTRATE BACKSIDE DAMAGE (18233751)

Main Inventor

Liangfa HU

FLUID-TIGHT ELECTRICAL CONNECTION TECHNIQUES FOR SEMICONDUCTOR PROCESSING (17974281)

Main Inventor

Chad Pollard

OLED ANODE STRUCTURES INCLUDING AMORPHOUS TRANSPARENT CONDUCTING OXIDES AND OLED PROCESSING METHOD COMPRISING THE SAME (17985632)

Main Inventor

Chung-Chia Chen

SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF (18231414)

Main Inventor

Minrui YU