20240049502. DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)
Contents
DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME
Organization Name
Inventor(s)
DEOKHOI Kim of Seongnam-si (KR)
DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240049502 titled 'DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME
Simplified Explanation
The method described in the patent application involves the following steps:
1. Providing an active pattern and gate metal patterns, as well as inorganic insulation layers in a pixel area and extending to a bending area. 2. Creating a first photoresist pattern that defines a first opening in the bending area. 3. Using the first photoresist pattern to etch at least one of the inorganic layers in the bending area. 4. Creating a remaining photoresist pattern that defines a first remaining opening corresponding to the first opening and a second opening corresponding to the active pattern. 5. Using the remaining photoresist pattern to create a contact hole corresponding to the second opening and expose the portion of the active pattern outside the remaining photoresist pattern. 6. Exposing a portion of the base substrate corresponding to the first remaining opening and outside the remaining photoresist pattern.
- The patent application describes a method for fabricating a pixel area with active and gate metal patterns, as well as inorganic insulation layers, that can extend into a bending area.
- The method involves using photoresist patterns to selectively etch the inorganic layers in the bending area and create openings for contact holes and exposing the active pattern and base substrate.
- This technology can be used in the manufacturing of flexible displays or other electronic devices that require bending capabilities.
- The method solves the problem of integrating active and gate metal patterns, as well as insulation layers, into a bending area without compromising their functionality.
- By providing a simplified process for creating contact holes and exposing the active pattern and base substrate, this technology enables the fabrication of flexible electronic devices with improved performance and durability.
Original Abstract Submitted
a method includes providing an active pattern and gate metal patterns, and inorganic insulation layers respectively therebetween in a pixel area and each extending to a bending area, providing a first photoresist pattern defining a first opening in the bending area, providing by using the first photoresist pattern, at least one of the inorganic layers in the bending area which is etched, providing a remaining photoresist pattern defining a first remaining opening corresponding to the first opening and a second opening corresponding to the active pattern, and providing by using the remaining photoresist pattern, both a contact hole corresponding to the second opening and exposing the portion of the active pattern to outside the remaining photoresist pattern, and a portion of the base substrate corresponding to the first remaining opening and exposed to outside the remaining photoresist pattern.
