20240047169. Simple Spherical Aberration Corrector for SEM simplified abstract (FEI Company)
Contents
Simple Spherical Aberration Corrector for SEM
Organization Name
Inventor(s)
Alexander Henstra of Utrecht (NL)
Ali Mohammadi-gheidari of Best (NL)
Simple Spherical Aberration Corrector for SEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240047169 titled 'Simple Spherical Aberration Corrector for SEM
Simplified Explanation
The abstract of the patent application describes optical corrector modules for charged particle columns that consist of split multipoles. These split multipoles are composed of two individual multipoles separated by a distance less than 10 mm, 1 m, 100 μm, and/or 10 μm. Each individual multipole is made up of at least two electrodes that partially define a beam path through the multipole. The electrodes have a first surface facing upstream of the charged particle beam and a second surface facing downstream of the beam. The thickness between the first and second surfaces of each electrode is less than 10 mm, 5 mm, and/or 3 mm. The split multipoles can be electrostatic and may correspond to hexapoles.
- The patent application describes optical corrector modules for charged particle columns.
- These modules consist of split multipoles composed of two individual multipoles.
- The individual multipoles are separated by a distance less than 10 mm, 1 m, 100 μm, and/or 10 μm.
- Each individual multipole is made up of at least two electrodes that partially define a beam path.
- The electrodes have a first surface facing upstream of the charged particle beam and a second surface facing downstream.
- The thickness between the first and second surfaces of each electrode is less than 10 mm, 5 mm, and/or 3 mm.
- The split multipoles can be electrostatic and may correspond to hexapoles.
Potential applications of this technology:
- Optical corrector modules can be used in charged particle columns, such as electron microscopes or particle accelerators, to correct aberrations and improve the quality of the beam.
- These modules can be used in research laboratories, semiconductor manufacturing, materials science, and other fields where precise control of charged particle beams is required.
Problems solved by this technology:
- Optical corrector modules with split multipoles allow for more precise correction of aberrations in charged particle columns.
- The use of split multipoles provides greater flexibility in adjusting the beam path and optimizing the performance of the column.
- The smaller distance between the individual multipoles allows for more compact and efficient designs.
Benefits of this technology:
- Improved beam quality and resolution in charged particle columns.
- Enhanced control and correction of aberrations, leading to more accurate imaging and analysis.
- Compact and efficient design, allowing for easier integration into existing systems.
- Greater flexibility in adjusting the beam path, enabling customization for specific applications.
Original Abstract Submitted
optical corrector modules for charged particle columns which comprise split multipoles, according to the present invention include at least one split multipole composed of two multipoles separated by a distance less than 10 mm, 1 m, 100 �m, and/or 10 �m. each of the individual multipoles may comprise at least two electrodes positioned to partially define a beam path through the multipole. according to the present invention, each of the electrodes comprises: a first surface that faces upstream of a charged particle beam when used in the charged particle column; and a second surface that faces downstream of the charged particle beam when used in the charged particle column, wherein the thickness between the first surface and the second surface for each of the electrodes is less than 10 mm, 5 mm, and/or 3 mm. within the scope of the disclosure, the split multipoles may be electrostatic and may correspond to hexapoles.
