20240038490. METHOD FOR SETTING GAP BETWEEN CATHODE AND FILAMENT simplified abstract (Axcelis Technologies, Inc.)

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METHOD FOR SETTING GAP BETWEEN CATHODE AND FILAMENT

Organization Name

Axcelis Technologies, Inc.

Inventor(s)

Steven T. Drummond of Merrimac MA (US)

Joshua Max Abeshaus of Salem MA (US)

METHOD FOR SETTING GAP BETWEEN CATHODE AND FILAMENT - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240038490 titled 'METHOD FOR SETTING GAP BETWEEN CATHODE AND FILAMENT

Simplified Explanation

The abstract describes a cathode apparatus for an ion source, which includes a cathode with a positioning feature and a blind hole. The cathode holder has an aperture with a thru-hole and a locating feature along the aperture axis. The cathode can be aligned in two positions based on the rotational orientation of the positioning feature with respect to the locating feature. The first alignment position places the cathode at a first axial position along the aperture axis, while the second alignment position places it at a second axial position along the axial axis. The filament device includes a filament clamp, a filament rod defining a filament axis, and a filament coupled to the filament rod. The filament clamp selectively engages with the filament rod to position the filament along the filament axis within the blind hole.

  • The cathode apparatus allows for precise positioning of the cathode in two different axial positions.
  • The filament device enables selective positioning of the filament along the filament axis within the blind hole.

Potential Applications

  • Ion sources used in various scientific and industrial applications, such as mass spectrometry, surface analysis, and ion implantation.
  • Electron microscopy and electron beam lithography systems.
  • Plasma processing equipment for semiconductor manufacturing.

Problems Solved

  • Precise alignment and positioning of the cathode in an ion source.
  • Selective positioning of the filament within the blind hole.

Benefits

  • Improved performance and efficiency of ion sources.
  • Enhanced control over the ion beam characteristics.
  • Extended lifespan of the filament due to precise positioning.


Original Abstract Submitted

a cathode apparatus for an ion source has a cathode with a positioning feature and a blind hole. a cathode holder has an aperture defined by a thru-hole and a locating feature defined along an aperture axis. the thru-hole receives the cathode along the aperture axis in first and second alignment positions based on a rotational orientation of the positioning feature with respect to the locating feature. the first alignment position locates the cathode at a first axial position along the aperture axis. the second alignment position locates the cathode at a second axial position along the axial axis. a filament device has a filament clamp, a filament rod defining a filament axis, and a filament coupled to the filament rod. the filament clamp is in selective engagement with the filament rod to selectively position the filament along the filament axis within the blind hole.

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