20240030043. NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)

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NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME

Organization Name

SAMSUNG DISPLAY CO., LTD.

Inventor(s)

Takayuki Fukasawa of Yongin-si (KR)

NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240030043 titled 'NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME

Simplified Explanation

The abstract describes a neutral beam annealing apparatus that is used for annealing substrates. The apparatus includes a plasma chamber, a gas supplier, electrodes, an induction coil, a substrate support, an annealing chamber, and a pressure controller.

  • The plasma chamber has a cylinder shape and is used to form plasma.
  • The first gas supplier supplies a gas to form the plasma.
  • The first electrode is coupled to the upper surface of the plasma chamber.
  • The induction coil is wound around the outer circumference of the plasma chamber and receives a high-frequency voltage from a power supply.
  • The second electrode is coupled to the lower surface of the plasma chamber and has through holes defined in it.
  • The substrate support supports the substrate to be annealed and adjusts the vertical distance between the substrate and the second electrode.
  • The annealing chamber accommodates the substrate support.
  • The pressure controller supplies a second gas to the annealing chamber.

Potential applications of this technology:

  • Semiconductor manufacturing: The apparatus can be used for annealing semiconductor substrates, improving their electrical properties and performance.
  • Thin film deposition: The apparatus can be used for annealing thin films, enhancing their adhesion and stability.
  • Solar cell production: The apparatus can be used for annealing solar cell substrates, optimizing their efficiency and output.

Problems solved by this technology:

  • Uniform annealing: The apparatus ensures uniform heating and annealing of the substrate, preventing localized defects and inconsistencies.
  • Contamination control: The plasma chamber and gas supply system minimize the introduction of impurities, ensuring a clean annealing process.
  • Precise control: The substrate support allows for precise adjustment of the distance between the substrate and the second electrode, enabling control over the annealing conditions.

Benefits of this technology:

  • Improved substrate quality: The apparatus enhances the quality and performance of substrates by providing controlled and uniform annealing.
  • Increased productivity: The efficient and precise annealing process reduces production time and improves overall productivity.
  • Cost savings: The apparatus minimizes material waste and reduces the need for rework, resulting in cost savings for manufacturers.


Original Abstract Submitted

a neutral beam annealing apparatus includes a plasma chamber having a cylinder shape, a first gas supplier to supply a first gas for forming plasma, a first electrode coupled to an upper surface of the plasma chamber, an induction coil wound around an outer circumference of the plasma chamber to receive a high-frequency voltage from a high-frequency power supply, a second electrode which is coupled to a lower surface of the plasma chamber, and in which through holes are defined, a substrate support supporting a substrate to be annealed and adjusting a vertical distance between the substrate and the second electrode, an annealing chamber accommodating the substrate support, and a pressure controller which supplies a second gas to the annealing chamber.

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