IMAGE SENSOR AND MANUFACTURING METHOD THEREOF

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IMAGE SENSOR AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240021639 titled 'IMAGE SENSOR AND MANUFACTURING METHOD THEREOF

Simplified Explanation

The manufacturing method described in the patent application involves several operations to create a lens layer on a substrate. This includes forming a lens layer above the substrate and a patterned hard mask layer on top of the lens layer. The pattern of the hard mask layer is then transferred to the lens layer through etching, resulting in the formation of multiple micro-lenses or meta-surface lenses. A cladding layer is then formed to cover the lenses and the substrate. Portions of the cladding layer are etched to create two inclined sidewalls, with one above the other, and their projections on the substrate are spaced apart.

The method involves forming a lens layer and a patterned hard mask layer on a substrate.
The pattern of the hard mask layer is transferred to the lens layer through etching, creating multiple micro-lenses or meta-surface lenses.
A cladding layer is formed to cover the lenses and the substrate.
Inclined sidewalls are created by etching portions of the cladding layer, with one sidewall above the other and spaced apart on the substrate.

Potential Applications:

Optical devices and systems
Microscopy
Imaging technologies
Augmented reality/virtual reality displays

Problems Solved:

Efficient and precise manufacturing of micro-lenses or meta-surface lenses
Creation of inclined sidewalls for improved optical performance
Integration of lenses into various optical devices

Benefits:

Enhanced optical performance
Compact and lightweight optical devices
Improved image quality and resolution
Versatile integration into different applications

Original Abstract Submitted

a manufacturing method includes the following operations. a lens layer is formed above a substrate. a patterned hard mask layer is formed on the lens layer. the lens layer is etched to transfer a pattern of the patterned hard mask layer to the lens layer such that a plurality of lenses are defined, wherein the lens are micro-lenses or meta-surface lenses. a cladding layer is formed to cover the plurality of lenses and the substrate. portions of the cladding layer are etched to form a first inclined sidewall and a second inclined sidewall, wherein the first inclined sidewall is above the second inclined sidewall, wherein a projection of the first inclined sidewall on the substrate is spaced apart from a projection of the second inclined sidewall on the substrate.

20240021639. IMAGE SENSOR AND MANUFACTURING METHOD THEREOF simplified abstract (VisEra Technologies Company Ltd.)

Contents

IMAGE SENSOR AND MANUFACTURING METHOD THEREOF

Organization Name

Inventor(s)