20240021444. BATCH PROCESSING APPARATUS, SYSTEMS, AND RELATED METHODS AND STRUCTURES FOR EPITAXIAL DEPOSITION OPERATIONS simplified abstract (APPLIED MATERIALS, INC.)

BATCH PROCESSING APPARATUS, SYSTEMS, AND RELATED METHODS AND STRUCTURES FOR EPITAXIAL DEPOSITION OPERATIONS

Organization Name

APPLIED MATERIALS, INC.

Inventor(s)

Manjunath Subbanna of Bangalore (IN)

Ala Moradian of Sunnyvale CA (US)

Errol Antonio C. Sanchez of Tracy CA (US)

Zuoming Zhu of Sunnyvale CA (US)

Peydaye Saheli Ghazal of Saratoga CA (US)

Martin Jeffrey Salinas of San Jose CA (US)

Aniketnitin Patil of San Jose CA (US)

Raja Murali Dhamodharan of Madurai (IN)

Shu-Kwan Lau of Sunnyvale CA (US)

BATCH PROCESSING APPARATUS, SYSTEMS, AND RELATED METHODS AND STRUCTURES FOR EPITAXIAL DEPOSITION OPERATIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240021444 titled 'BATCH PROCESSING APPARATUS, SYSTEMS, AND RELATED METHODS AND STRUCTURES FOR EPITAXIAL DEPOSITION OPERATIONS

Simplified Explanation

The present disclosure is about batch processing apparatus, systems, and methods for epitaxial deposition operations. One implementation of the apparatus includes a cassette that is partially supported by a pedestal assembly. The cassette consists of multiple levels arranged vertically, with each level having a support surface for holding a substrate. The spacing between adjacent levels is 25 mm or higher and is defined by the distance between the support surfaces of the adjacent levels.

• The apparatus is designed for substrate processing in epitaxial deposition operations.
• It includes a cassette that is supported by a pedestal assembly.
• The cassette has multiple levels arranged vertically.
• Each level has a support surface for holding a substrate.
• The spacing between adjacent levels is 25 mm or higher.

Potential applications of this technology:

• Epitaxial deposition operations in semiconductor manufacturing.
• Batch processing of substrates for efficient and high-volume production.

Problems solved by this technology:

• Provides a compact and efficient system for batch processing of substrates.
• Allows for easy loading and unloading of substrates.
• Reduces the risk of substrate damage during processing.

Benefits of this technology:

• Increases productivity by enabling batch processing of multiple substrates simultaneously.
• Reduces processing time and costs.
• Improves the overall efficiency of epitaxial deposition operations.

Original Abstract Submitted

the present disclosure relates to batch processing apparatus, systems, and related methods and structures for epitaxial deposition operations. in one implementation, an apparatus for substrate processing includes a cassette. the cassette is at least partially supported by a pedestal assembly. the cassette includes a plurality of levels arranged vertically with respect to each other, each level of the plurality of levels including a support surface configured to support a substrate. a level spacing between adjacent levels of the plurality of levels is 25 mm or higher, and the level spacing is defined between the support surfaces of the adjacent levels.