20240016044. Semiconductor Device And Manufacturing Method Thereof simplified abstract (Semiconductor Energy Laboratory Co., Ltd.)
Contents
Semiconductor Device And Manufacturing Method Thereof
Organization Name
Semiconductor Energy Laboratory Co., Ltd.
Inventor(s)
Hideaki Kuwabara of Isehara (JP)
Semiconductor Device And Manufacturing Method Thereof - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240016044 titled 'Semiconductor Device And Manufacturing Method Thereof
Simplified Explanation
The abstract of the patent application describes a method to address issues related to defects in the mask used during evaporation in the display region. It proposes the formation of a partition with different thicknesses over a pixel electrode using a photomask or reticle with an auxiliary pattern that reduces light intensity.
- The patent application proposes a method to form a partition with different thicknesses over a pixel electrode in a display region.
- The partition is formed using a photomask or reticle with an auxiliary pattern that reduces light intensity.
- The auxiliary pattern can be a diffraction grating pattern or a semi-transmissive film.
- The method aims to improve definition and increase the substrate size without increasing the number of steps.
- The proposed solution addresses issues related to defects caused by precision, bending, and other factors in the mask used during evaporation.
Potential Applications:
- This technology can be applied in the manufacturing of displays, such as LCDs or OLEDs.
- It can be used to improve the definition and increase the substrate size in display panels, resulting in enhanced image quality.
Problems Solved:
- The method addresses defects caused by precision, bending, and other factors in the mask used during evaporation.
- It overcomes issues related to miniaturization of pixel regions and the associated decrease in definition.
- The partition formation technique helps to increase the substrate size without adding extra steps in the manufacturing process.
Benefits:
- Improved definition and increased substrate size lead to enhanced image quality in displays.
- The method allows for the formation of partitions with different thicknesses without increasing the complexity of the manufacturing process.
- By reducing defects caused by the mask, the technology helps to improve the overall yield and reliability of display panels.
Original Abstract Submitted
as a result of miniaturization of a pixel region associated with an improvement in definition and an increase in a substrate size associated with an increase in area, defects due to precision, bending, and the like of a mask used at the time of evaporation have become issues. a partition including portions with different thicknesses over a pixel electrode (also referred to as a first electrode) in a display region and in the vicinity of a pixel electrode layer is formed, without increasing the number of steps, by using a photomask or a reticle provided with an auxiliary pattern having a light intensity reduction function made of a diffraction grating pattern or a semi-transmissive film.
