20240014055. SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)

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SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

Organization Name

Kokusai Electric Corporation

Inventor(s)

Kazuyoshi Yamamoto of Toyama-shi (JP)

Hidemoto Hayashihara of Toyama-shi (JP)

Kayoko Yashiki of Toyama-shi (JP)

Kyohei Kita of Toyama-shi (JP)

Kazuhide Asai of Toyama-shi (JP)

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240014055 titled 'SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

Simplified Explanation

The abstract describes a technique involving a substrate processing apparatus and a data manager. The substrate processing apparatus is capable of controlling the processing of a substrate based on a recipe, and it has a memory to store data reported during the processing. The data manager is connected to the substrate processing apparatus and is responsible for acquiring the data. It can also specify the number of steps included in the data to be acquired, ensuring that the data falls within a predefined range.

  • The technique involves a substrate processing apparatus and a data manager.
  • The substrate processing apparatus can control the processing of a substrate based on a recipe.
  • The apparatus has a memory to store data reported during the processing.
  • The data manager is connected to the substrate processing apparatus.
  • The data manager acquires the data and can specify the number of steps to be acquired.
  • The data manager ensures that the acquired data falls within a predefined range.

Potential Applications:

  • Semiconductor manufacturing: This technique can be used in the production of semiconductor devices, where precise control and monitoring of substrate processing steps are crucial.
  • Thin film deposition: The technique can be applied in processes such as chemical vapor deposition or physical vapor deposition, ensuring accurate data acquisition and control.
  • Solar cell production: Solar cell manufacturing involves various substrate processing steps, and this technique can enhance the efficiency and quality of the production process.

Problems Solved:

  • Inaccurate data acquisition: The technique solves the problem of acquiring irrelevant or excessive data during substrate processing by allowing the data manager to specify the number of steps to be acquired.
  • Data management and control: The technique provides a solution for managing and controlling the data reported during substrate processing, ensuring that it falls within a predefined range.

Benefits:

  • Improved process control: The technique enables precise control of substrate processing steps, leading to improved product quality and yield.
  • Efficient data acquisition: By specifying the number of steps to be acquired, the technique optimizes data acquisition, reducing unnecessary data storage and processing.
  • Enhanced data management: The data manager facilitates efficient data acquisition, storage, and control, improving overall process efficiency and reliability.


Original Abstract Submitted

there is provided a technique, which includes: at least one substrate processing apparatus including a controller configured to be capable of controlling processing of a substrate according to a recipe including at least one step and a first memory configured to be capable of storing data of the at least one substrate processing apparatus that is reported during the processing of the substrate; and a data manager connected to the at least one substrate processing apparatus, configured to acquire the data, and configured to be capable of specifying the number of the at least one step that is included in the data to be acquired such that the data falls within a predefined data acquirable range.

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