20240012326. PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN simplified abstract (ASAHI KASEI KABUSHIKI KAISHA)

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PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN

Organization Name

ASAHI KASEI KABUSHIKI KAISHA

Inventor(s)

Shota Yanagi of Tokyo (JP)

PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240012326 titled 'PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN

Simplified Explanation

The abstract describes a photosensitive element consisting of a support film and a photosensitive resin composition layer. The developed interfacial ratios of the support film on both sides satisfy a specific formula.

  • The photosensitive element consists of a support film and a photosensitive resin composition layer.
  • The developed interfacial ratios of the support film on both sides must satisfy a specific formula.
  • The formula is defined as sdr/sdr < 0.75, where sdr represents the developed interfacial ratio.
  • The abstract mentions the ISO 25178 standard as a reference for defining the interfacial ratios.
  • The abstract does not provide further details about the specific composition or application of the photosensitive element.

Potential Applications:

  • This photosensitive element could be used in various industries that require photosensitive materials, such as photography, printing, or lithography.
  • It may find applications in the production of printed circuit boards, where photosensitive elements are used for etching patterns onto the boards.
  • The element could be utilized in the manufacturing of microelectromechanical systems (MEMS) or microfluidic devices, where precise patterning is crucial.

Problems Solved:

  • The photosensitive element ensures a specific developed interfacial ratio between the support film and the photosensitive resin composition layer.
  • This ratio may be important for achieving desired properties or performance in the final product.
  • By defining and controlling the interfacial ratios, the element addresses potential issues related to adhesion, uniformity, or compatibility between the layers.

Benefits:

  • The photosensitive element provides a controlled and optimized interface between the support film and the photosensitive resin composition layer.
  • It allows for improved adhesion and compatibility between the layers, leading to enhanced overall performance.
  • The defined interfacial ratios ensure consistent and reliable results in the manufacturing process.
  • The element may contribute to the production of high-quality and precise patterns in various applications.


Original Abstract Submitted

a photosensitive element including, in this order, a support film (a) and a photosensitive resin composition layer (b), wherein a developed interfacial ratio sdr(%) of an interface of the support film (a) on a side in contact with the photosensitive resin composition layer (b) and a developed interfacial ratio sdr(%) of an interface thereof on the opposite side as defined in iso 25178 satisfy the following formula (1): sdr/sdr<0.75 (1)

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