20240012230. OBSERVATION SYSTEM AND OBSERVATION DEVICE simplified abstract (Evident Corporation)
Contents
OBSERVATION SYSTEM AND OBSERVATION DEVICE
Organization Name
Inventor(s)
Shintaro Takahashi of Nagano (JP)
OBSERVATION SYSTEM AND OBSERVATION DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240012230 titled 'OBSERVATION SYSTEM AND OBSERVATION DEVICE
Simplified Explanation
The patent application describes an observation system that includes a mounting table, a surface light source, an observation optical system, a conveyance mechanism, and a controller.
- The mounting table is where a sample container is placed.
- The surface light source is divided into two regions by the mounting table and emits light on a light emitting plane.
- The observation optical system is located in the other region of the surface light source.
- The conveyance mechanism moves the observation optical system in a direction perpendicular to the optical axis of the observation optical system, allowing for a change in observation position.
- The controller controls the light emission pattern defined by the light emitting region on the light emitting plane.
The patent application explains that the controller can execute two types of light emission pattern control:
- First light emission pattern control: The light emission pattern is changed according to the observation position.
- Second light emission pattern control: The light emission pattern is switched between multiple periodic light emission patterns with different phases.
Potential applications of this technology:
- Microscopy: The observation system can be used in microscopy applications to observe samples at different positions and with different light emission patterns.
- Quality control: The system can be used in manufacturing processes to inspect samples and detect defects or anomalies.
Problems solved by this technology:
- Improved observation flexibility: The conveyance mechanism allows for easy adjustment of the observation position, providing flexibility in sample analysis.
- Enhanced image quality: By controlling the light emission pattern, the system can optimize the illumination conditions for better image quality.
Benefits of this technology:
- Increased efficiency: The system allows for quick and precise adjustment of the observation position, saving time in sample analysis.
- Improved accuracy: By controlling the light emission pattern, the system can enhance the visibility of specific features in the sample, leading to more accurate analysis and detection of defects.
Original Abstract Submitted
an observation system includes a mounting table on which a sample container is placed, a surface light source that is disposed in one of two regions divided by the mounting table and has a light emitting plane, an observation optical system disposed in the other thereof, a conveyance mechanism moving the observation optical system in a direction orthogonal to an optical axis of the observation optical system to change an observation position, and a controller controlling a light emission pattern defined by a light emitting region where light is emitted on the light emitting plane. the controller executes first light emission pattern control in which the light emission pattern is changed according to the observation position, or, alternatively, second light emission pattern control in which the light emission pattern is switched between a plurality of periodic light emission patterns having phases different from each other.
