18545644. SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
Organization Name
Inventor(s)
Sangjine Park of Suwon-si (KR)
Jihwan Park of Hwaseong-si (KR)
Seungmin Shin of Suwon-si (KR)
SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18545644 titled 'SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
Simplified Explanation
The abstract describes a substrate processing apparatus with multiple chambers for different processes such as developing, drying, baking, and cooling of substrates in various states.
- The first process chamber performs a developing process on a dry substrate by supplying a developer.
- The second process chamber conducts a drying process on a wet substrate using a supercritical fluid.
- The third process chamber executes a bake operation on a dry substrate after the drying process.
- The fourth process chamber carries out a cooling operation on the substrate post-bake.
- A substrate transferring unit moves the substrate between the different process chambers.
Potential Applications
This technology could be applied in semiconductor manufacturing, photolithography, and other industries requiring precise substrate processing.
Problems Solved
This innovation streamlines the substrate processing workflow, ensuring efficient and effective completion of each stage without manual intervention.
Benefits
- Improved process control and consistency - Reduced cycle times and increased throughput - Enhanced quality and yield of finished substrates
Potential Commercial Applications
"Advanced Substrate Processing Apparatus for Semiconductor Manufacturing: Enhancing Efficiency and Quality"
Possible Prior Art
Prior art may include similar substrate processing apparatuses used in semiconductor fabrication or other precision manufacturing processes.
Unanswered Questions
1. What specific types of substrates are compatible with this apparatus? 2. How does the substrate transferring unit ensure precise and accurate movement between chambers?
Original Abstract Submitted
A substrate processing apparatus includes: a first process chamber in which a developing process is performed by supplying a developer to a substrate that is in a dry state; a second process chamber in which a drying process is performed on the substrate by supplying a supercritical fluid to the substrate on which the developing process is performed and which is in a wet state; a third process chamber in which a bake operation is performed on the substrate on which the drying operation is performed and is in a dry state; a fourth process chamber in which a cooling operation is performed on the substrate on which the bake operation is performed and is in a dry state; and a substrate transferring unit configured to transfer the substrate between the first to fourth process chambers.
