THERMAL PROCESSING SUSCEPTOR

The abstract describes a susceptor for thermal processing that includes an outer rim surrounding and coupled to an inner dish, with structures for reducing the contacting surface area between a substrate and the susceptor.

The susceptor for thermal processing includes an outer rim and an inner dish.
The outer rim has an inner edge and an outer edge.
One or more structures are included to reduce the contacting surface area between a substrate and the susceptor.
At least one structure is coupled to the inner dish near the inner edge of the outer rim.

Potential Applications

The technology could be used in various thermal processing applications such as semiconductor manufacturing, materials processing, and heat treatment processes.

Problems Solved

The susceptor design helps to reduce the contact area between the substrate and the susceptor, which can prevent contamination, improve thermal uniformity, and enhance overall processing efficiency.

Benefits

- Improved thermal processing efficiency - Reduced risk of contamination - Enhanced thermal uniformity during processing

Potential Commercial Applications

- Semiconductor manufacturing - Materials processing - Heat treatment processes

Possible Prior Art

There may be prior art related to susceptors for thermal processing in various industries, but specific examples are not provided in the abstract.

Unanswered Questions

How does the susceptor design impact the overall thermal processing time?

The abstract does not mention how the reduced contact area between the substrate and the susceptor affects the processing time.

Are there any limitations to the size or type of substrates that can be processed using this susceptor?

The abstract does not address whether there are any restrictions on the size or type of substrates that can be used with this susceptor design.

Original Abstract Submitted

In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.

18539507. THERMAL PROCESSING SUSCEPTOR simplified abstract (Applied Materials, Inc.)

Contents

THERMAL PROCESSING SUSCEPTOR

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