18536907. MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK simplified abstract (Samsung Display Co., LTD.)
Contents
- 1 MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 How does this technology compare to existing mask assembly designs in terms of cost-effectiveness and efficiency?
- 1.11 What are the potential limitations or challenges in implementing this mask assembly in different deposition processes or industries?
- 1.12 Original Abstract Submitted
MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK
Organization Name
Inventor(s)
YOUNGMIN Moon of Yongin-si (KR)
MINHO Moon of Seongnam-si (KR)
SEUNGYONG Song of Suwon-si (KR)
MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK - A simplified explanation of the abstract
This abstract first appeared for US patent application 18536907 titled 'MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK
Simplified Explanation
The patent application describes a mask assembly that includes a mask frame with a front surface and a deposition mask attached to the front surface, through which a plurality of second openings is defined.
- The mask frame has a first opening and the deposition mask has an initial mask with the same second openings, all aligned along the direction of gravity.
- The design ensures that the first opening of the mask frame corresponds to all of the second openings of the initial mask along the direction of gravity.
Potential Applications
This technology could be used in industries such as semiconductor manufacturing, photolithography, and other precision deposition processes.
Problems Solved
This innovation helps to ensure accurate alignment and deposition of materials through the mask assembly, reducing errors and improving overall product quality.
Benefits
- Improved precision in material deposition processes - Enhanced product quality and consistency - Simplified alignment procedures
Potential Commercial Applications
"Precision Mask Assembly for Semiconductor Manufacturing: Improving Deposition Accuracy"
Possible Prior Art
There may be prior art related to mask assemblies in semiconductor manufacturing or other precision industries, but specific examples are not provided in the patent application.
Unanswered Questions
How does this technology compare to existing mask assembly designs in terms of cost-effectiveness and efficiency?
The patent application does not provide information on the cost-effectiveness or efficiency of this technology compared to existing designs.
What are the potential limitations or challenges in implementing this mask assembly in different deposition processes or industries?
The patent application does not address potential limitations or challenges in implementing this technology in various deposition processes or industries.
Original Abstract Submitted
A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.
