18526472. SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)

SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

Organization Name

Kokusai Electric Corporation

Inventor(s)

Akinori Tanaka of Toyama-shi (JP)

Hideto Tateno of Toyama-shi (JP)

Sadayoshi Horii of Toyama-shi (JP)

SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM - A simplified explanation of the abstract

This abstract first appeared for US patent application 18526472 titled 'SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

Simplified Explanation

The patent application describes a technique for monitoring the reaction between a substrate and a reactive gas in a process chamber during substrate processing. The apparatus includes gas concentration sensors to detect the concentration of the reactive gas in the process gas supply pipe and exhaust pipe.

• Substrate processing apparatus for monitoring reaction progress:

   - Process chamber for accommodating substrate
   - Process gas supply system for supplying reactive gas
   - Exhaust pipe for removing inner atmosphere
   - First gas concentration sensor for detecting reactive gas in supply pipe
   - Second gas concentration sensor for detecting reactive gas in exhaust gas

Potential Applications

The technology can be applied in semiconductor manufacturing, chemical processing, and other industries where monitoring gas reactions is crucial for process control and quality assurance.

Problems Solved

1. Ensures accurate monitoring of gas reactions during substrate processing 2. Enables real-time adjustments to process parameters based on reaction progress

Benefits

1. Improved process control and efficiency 2. Enhanced product quality and consistency 3. Reduced waste and rework

Potential Commercial Applications

"Gas Reaction Monitoring Technology for Substrate Processing: Enhancing Process Control and Quality Assurance"

Possible Prior Art

There may be prior art related to gas concentration sensors in process chambers for monitoring reactions during substrate processing, but specific examples are not provided in the abstract.

How does this technology compare to traditional methods of monitoring gas reactions during substrate processing?

This technology offers real-time monitoring capabilities, which can lead to more precise control over the reaction progress compared to traditional methods that may rely on periodic sampling and analysis.

What are the limitations of using gas concentration sensors for monitoring reactions in a process chamber?

Gas concentration sensors may have limitations in terms of accuracy, sensitivity, and potential interference from other gases present in the chamber. Regular calibration and maintenance may be required to ensure reliable performance.

Original Abstract Submitted

Described herein is a technique capable of acquiring, monitoring, and recording the progress of the reaction between a substrate and a reactive gas contained in a process gas in a process chamber during the processing of the substrate. According to the technique, there is provided a substrate processing apparatus including: a process chamber accommodating a substrate; a process gas supply system configured to supply a process gas into the process chamber via a process gas supply pipe; an exhaust pipe configured to exhaust an inner atmosphere of the process chamber; a first gas concentration sensor configured to detect a first concentration of a reactive gas contained in the process gas in the process gas supply pipe; and a second gas concentration sensor configured to detect a second concentration of the reactive gas contained in an exhaust gas in the exhaust pipe.