18521314. Wafer Positioning Method and Apparatus simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
Contents
- 1 Wafer Positioning Method and Apparatus
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 Wafer Positioning Method and Apparatus - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
Wafer Positioning Method and Apparatus
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Liang-Yin Chen of Hsinchu (TW)
Wafer Positioning Method and Apparatus - A simplified explanation of the abstract
This abstract first appeared for US patent application 18521314 titled 'Wafer Positioning Method and Apparatus
Simplified Explanation
The patent application describes a method and apparatus for correcting misalignment of a wafer on a wafer holder in a semiconductor alignment apparatus.
- The semiconductor alignment apparatus includes:
- A wafer stage
- A wafer holder over the wafer stage
- A first position detector for detecting wafer alignment in a first direction
- A second position detector for detecting wafer alignment in a second direction
- A rotational detector for detecting rotational alignment of the wafer
Potential Applications
The technology can be applied in semiconductor manufacturing processes where precise alignment of wafers is crucial for the fabrication of integrated circuits.
Problems Solved
This technology solves the problem of misalignment of wafers on wafer holders, which can lead to defects in semiconductor devices and reduce manufacturing yield.
Benefits
The benefits of this technology include improved accuracy in wafer alignment, increased production efficiency, and higher quality semiconductor products.
Potential Commercial Applications
One potential commercial application of this technology is in semiconductor fabrication facilities where precise wafer alignment is essential for producing high-performance integrated circuits.
Possible Prior Art
Prior art in this field may include existing methods and apparatus for wafer alignment in semiconductor manufacturing processes. Further research and analysis are needed to identify specific prior art examples.
Unanswered Questions
How does the rotational detector work to detect rotational alignment of the wafer?
The rotational detector may use sensors or imaging technology to detect any rotational misalignment of the wafer on the wafer holder. Further details on the specific mechanism of the rotational detector would provide a clearer understanding of its operation.
What are the potential limitations or challenges in implementing this technology in semiconductor manufacturing processes?
Implementing this technology may require integration with existing semiconductor fabrication equipment and processes, as well as ensuring compatibility with different types of wafers and wafer holders. Understanding the potential limitations or challenges in implementation would be crucial for successful adoption of this technology.
Original Abstract Submitted
A method of correcting a misalignment of a wafer on a wafer holder and an apparatus for performing the same are disclosed. In an embodiment, a semiconductor alignment apparatus includes a wafer stage; a wafer holder over the wafer stage; a first position detector configured to detect an alignment of a wafer over the wafer holder in a first direction; a second position detector configured to detect an alignment of the wafer over the wafer holder in a second direction; and a rotational detector configured to detect a rotational alignment of the wafer over the wafer holder.
