18515697. SILICA PARTICLE AND METHOD FOR PRODUCING THE SAME simplified abstract (FUJIFILM Business Innovation Corp.)

SILICA PARTICLE AND METHOD FOR PRODUCING THE SAME

Organization Name

FUJIFILM Business Innovation Corp.

Inventor(s)

Yuka Zenitani of Kanagawa (JP)

Koji Sasaki of Kanagawa (JP)

Sakae Takeuchi of Kanagawa (JP)

Yoshifumi Eri of Kanagawa (JP)

Takahiro Mizuguchi of Kanagawa (JP)

SILICA PARTICLE AND METHOD FOR PRODUCING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18515697 titled 'SILICA PARTICLE AND METHOD FOR PRODUCING THE SAME

Simplified Explanation

The patent application describes a silica particle containing a quaternary ammonium salt that meets specific criteria related to pore diameter distribution before and after washing and sintering.

• The silica particle contains a quaternary ammonium salt.
• The pore diameter distribution of the silica particles is analyzed before and after washing and sintering.
• Specific criteria for pore diameter distribution are met, including maximum frequency values of pore diameters of 2 nm or less.

Potential Applications

The technology could be applied in:

• Catalysis
• Drug delivery systems
• Adsorbents for gas separation

Problems Solved

This technology addresses issues related to:

• Controlling pore size distribution in silica particles
• Enhancing the performance of silica-based materials
• Improving the stability of silica particles under different conditions

Benefits

The benefits of this technology include:

• Increased efficiency in catalytic reactions
• Enhanced drug delivery capabilities
• Improved adsorption properties for gas separation processes

Potential Commercial Applications

The technology could find commercial applications in:

• Pharmaceutical industry
• Chemical manufacturing
• Environmental engineering

Possible Prior Art

Prior research may exist on:

• Silica particle functionalization
• Pore size control in porous materials

How does this technology compare to existing silica particle modifications in terms of pore size distribution control?

This article does not provide a direct comparison with other methods of pore size distribution control in silica particles. Further research or comparative studies may be needed to evaluate the effectiveness of this technology in relation to existing methods.

What specific industries or research fields could benefit the most from the use of these silica particles with controlled pore size distribution?

While the potential applications of the technology are mentioned, a more detailed analysis of the industries or research fields that could benefit the most from this innovation is not provided. Further market research or case studies may be necessary to identify the most promising sectors for implementation.

Original Abstract Submitted

A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90≤F/F≤1.10, and 5≤F/F≤20, in which Frepresents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, Frepresents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and Frepresents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600° C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.