18514859. SPACE FILLING DEVICE FOR WET BENCH simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
Contents
SPACE FILLING DEVICE FOR WET BENCH
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Chih-Shen Yang of Hsinchu (TW)
Cheng-Yi Huang of Hsinchu (TW)
SPACE FILLING DEVICE FOR WET BENCH - A simplified explanation of the abstract
This abstract first appeared for US patent application 18514859 titled 'SPACE FILLING DEVICE FOR WET BENCH
Simplified Explanation
The disclosed techniques involve a space filling device for wet benches in chemical replacement procedures, with higher density than the purging chemicals.
- The space filling device is designed for wet benches in chemical replacement procedures.
- It has a higher overall density compared to the chemicals used to purge the wet bench.
- When embedded into the wet bench, it occupies a portion of the interior volume space.
- This results in less purging chemicals needed to fill and bathe the wet bench.
Potential Applications
The technology can be applied in various industries where wet benches are used for chemical replacement procedures, such as semiconductor manufacturing, pharmaceuticals, and research laboratories.
Problems Solved
1. Reduces the amount of purging chemicals required for wet bench procedures. 2. Improves efficiency by optimizing the use of chemicals in the process. 3. Helps in cost reduction by minimizing chemical waste.
Benefits
1. Lower chemical consumption leads to cost savings. 2. Enhanced environmental sustainability by reducing chemical waste. 3. Increased efficiency in wet bench operations.
Original Abstract Submitted
The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.
