18511845. IN-SITU CLOSED-LOOP MANAGEMENT OF RADIO FREQUENCY POWER GENERATOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
IN-SITU CLOSED-LOOP MANAGEMENT OF RADIO FREQUENCY POWER GENERATOR
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
IN-SITU CLOSED-LOOP MANAGEMENT OF RADIO FREQUENCY POWER GENERATOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18511845 titled 'IN-SITU CLOSED-LOOP MANAGEMENT OF RADIO FREQUENCY POWER GENERATOR
Simplified Explanation
The present disclosure involves in situ closed-loop RF power management for RF processes such as plasma etch, deposition, and cleaning.
- An RF power measurement device is used to assist in the closed-loop RF power management.
- The device includes a coil-shaped current sensor that senses the current flowing between the RF generator and the chamber.
- This allows for calibration of the RF generator's power without needing to separate it for analysis and calibration.
- The RF power measurement device enables in situ closed-loop management of RF power.
Potential Applications
- Semiconductor manufacturing
- Thin film deposition processes
- Plasma cleaning processes
Problems Solved
- Ensuring accurate calibration of RF power in RF processes
- Improving process control and efficiency
- Minimizing downtime for calibration and analysis
Benefits
- Enhanced process control and efficiency
- Reduced downtime for calibration
- Improved product quality and consistency
Original Abstract Submitted
The present disclosure is directed to an in situ closed-loop radio frequency (RF) power management on RF processes such as a plasma etch process, a plasma chemical vapor deposition process, a plasma physical vapor deposition process, a plasma clean process, or the like. An RF power measurement device according to one or more embodiments of the present disclosure assists the in situ closed-loop RF power management on RF processes. In some embodiments, the RF power measurement device includes a coil-shaped current sensor that is wound around the path between an RF generator and a chamber. The coil-shaped current sensor senses the current flowing through this path so that the power of the RF generator may be calibrated without having to separate the RF generator for separate analysis and calibration. The RF power measurement device allows management of RF power in an in situ closed-loop manner.
