18496015. SUBSTRATE PROCESSING SYSTEM AND ITS CONTROL METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
SUBSTRATE PROCESSING SYSTEM AND ITS CONTROL METHOD
Organization Name
Inventor(s)
TAICHI Yoshioka of Tochigi (JP)
NOBUYUKI Kawabata of Tochigi (JP)
SUBSTRATE PROCESSING SYSTEM AND ITS CONTROL METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18496015 titled 'SUBSTRATE PROCESSING SYSTEM AND ITS CONTROL METHOD
Simplified Explanation
The abstract describes a substrate processing system that includes multiple control apparatus and distributors to control and monitor the substrate processing apparatus.
- The system includes a substrate processing apparatus, an input/output apparatus, a first control apparatus with first software to control the substrate processing apparatus and acquire signals, a second control apparatus with second software for calculation processing, a first distributor to distribute signals to the second control apparatus, and a second distributor to distribute signals to the second control apparatus.
- The second control apparatus outputs a signal based on the signals received from the first control apparatus and the substrate processing apparatus.
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- Potential Applications
- Semiconductor manufacturing
- Thin film deposition processes
- Solar panel production
- Problems Solved
- Improved control and monitoring of substrate processing apparatus
- Enhanced accuracy in calculation processing
- Efficient distribution of signals between control apparatus
- Benefits
- Increased productivity in substrate processing
- Enhanced quality control in manufacturing processes
- Improved efficiency in overall system operation
Original Abstract Submitted
A substrate processing system includes a substrate processing apparatus, an input/output apparatus, a first control apparatus installed with first software, configured to control the substrate processing apparatus based on a first signal output from the input/output apparatus, and configured to acquire a second signal output from the substrate processing apparatus, a second control apparatus installed with second software, and configured to perform same calculation processing as that of the first control apparatus, and not configured to control the substrate processing apparatus, a first distributor configured to distribute the first signal to the second control apparatus, and a second distributor configured to distribute the second signal to the second control apparatus. The second control apparatus outputs a third signal based on the first signal and the second signal.
