18487216. IMAGE SENSOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

From WikiPatents
Jump to navigation Jump to search

IMAGE SENSOR DEVICE

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Yun-Wei Cheng of Taipei City (TW)

Chun-Hao Chou of Tainan City (TW)

Kuo-Cheng Lee of Tainan City (TW)

Hsun-Ying Huang of Tainan City (TW)

IMAGE SENSOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18487216 titled 'IMAGE SENSOR DEVICE

Simplified Explanation

The abstract describes an image sensor device that includes a substrate with a front surface, back surface, and a light-sensing region. The device also includes a first isolation structure that surrounds a portion of the light-sensing region and has an H-like shape. Additionally, there is a second isolation structure that surrounds another portion of the light-sensing region and extends from the back surface to the end portion of the first isolation structure.

  • The image sensor device has a unique first isolation structure with an H-like shape.
  • The second isolation structure extends from the back surface to the end portion of the first isolation structure.
  • The device effectively isolates different portions of the light-sensing region.

Potential applications of this technology:

  • Image sensors in digital cameras and smartphones.
  • Surveillance cameras and security systems.
  • Medical imaging devices.

Problems solved by this technology:

  • Efficient isolation of different portions of the light-sensing region.
  • Improved image quality by reducing cross-talk between pixels.

Benefits of this technology:

  • Enhanced image sensor performance.
  • Higher resolution and improved image quality.
  • Increased sensitivity to light.
  • Reduction in noise and interference.

Potential Applications

  • Image sensors in digital cameras and smartphones.
  • Surveillance cameras and security systems.
  • Medical imaging devices.

Problems Solved

  • Efficient isolation of different portions of the light-sensing region.
  • Improved image quality by reducing cross-talk between pixels.

Benefits

  • Enhanced image sensor performance.
  • Higher resolution and improved image quality.
  • Increased sensitivity to light.
  • Reduction in noise and interference.


Original Abstract Submitted

An image sensor device is provided. The image sensor device includes a substrate having a front surface, a back surface, and a light-sensing region. The image sensor device includes a first isolation structure extending from the front surface into the substrate. The first isolation structure surrounds a first portion of the light-sensing region, the first isolation structure has an etch stop layer, the etch stop layer has an end portion, and the end portion has an H-like shape. The image sensor device includes a second isolation structure extending into the substrate from the back surface to the end portion. The second isolation structure surrounds a second portion of the light-sensing region.

Retrieved from "http://wikipatents.org/index.php?title=18487216._IMAGE_SENSOR_DEVICE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=31689"