18471652. EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER simplified abstract (Samsung Electronics Co., Ltd.)
Contents
- 1 EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER
Organization Name
Inventor(s)
Changseok Yoo of Suwon-si (KR)
EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER - A simplified explanation of the abstract
This abstract first appeared for US patent application 18471652 titled 'EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER
Simplified Explanation
The exhaust system described in the patent application is designed for semiconductor processing, with components such as a process chamber, buffer, reactor, wet tank, and wet tower working together to handle waste gas and powder generated during the processing.
- The process chamber is where semiconductor processing takes place.
- The buffer receives waste gas and disperses powder generated during processing.
- The reactor burns the waste gas.
- The wet tank stores cleaning water below the reactor.
- The wet tower decomposes powder in the waste gas using the cleaning water.
Potential Applications
The technology described in the patent application could be applied in semiconductor manufacturing facilities to improve exhaust system efficiency and reduce environmental impact.
Problems Solved
This technology addresses the challenges of managing waste gas and powder generated during semiconductor processing, ensuring a cleaner and more efficient operation.
Benefits
The benefits of this technology include improved air quality, reduced emissions, and enhanced safety in semiconductor processing facilities.
Potential Commercial Applications
The exhaust system innovation could be commercially applied in semiconductor manufacturing plants to enhance environmental sustainability and compliance with regulations.
Possible Prior Art
Prior art in the field of exhaust systems for semiconductor processing may include similar technologies designed to address waste gas and powder management, but the specific combination of components described in this patent application may be unique.
Unanswered Questions
How does the efficiency of this exhaust system compare to traditional systems?
The patent application does not provide specific data on the efficiency of the exhaust system compared to traditional systems.
What are the potential maintenance requirements for this exhaust system?
Details on the maintenance needs of the exhaust system, such as cleaning schedules or replacement parts, are not included in the patent application.
Original Abstract Submitted
An exhaust system including a process chamber in which a semiconductor processing is performed, a buffer connected to the process chamber, the buffer configured to receive waste gas generated during the semiconductor processing and dualize and disperse powder generated from the waste gas may be provided, a reactor configured to burn the waste gas, a wet tank connected to the reactor, arranged below the reactor, and configured to store cleaning water, and a wet tower configured to decompose the powder in the waste gas by using the cleaning water may be provided.
