18467775. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract (Panasonic Intellectual Property Management Co., Ltd.)
Contents
- 1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Organization Name
Panasonic Intellectual Property Management Co., Ltd.
Inventor(s)
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18467775 titled 'PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Simplified Explanation
The plasma processing apparatus described in the abstract includes a first support member for raising and lowering an object to be processed, a second support member supporting a cover, and a drive part for raising and lowering the cover via the second support member. The drive part can raise the cover without raising the object to be processed in a first process, and can raise both the cover and the object to be processed integrally in a second process.
- First support member for raising and lowering the object to be processed
- Second support member for supporting the cover
- Drive part for raising and lowering the cover via the second support member
- Ability to raise the cover without raising the object in a first process
- Ability to raise both the cover and the object integrally in a second process
Potential Applications
The technology described in this patent application could be applied in industries such as semiconductor manufacturing, where precise plasma processing of objects is required.
Problems Solved
This technology solves the problem of independently raising the cover and the object to be processed, allowing for more flexibility and control in plasma processing operations.
Benefits
The benefits of this technology include improved efficiency, accuracy, and control in plasma processing operations, leading to higher quality end products.
Potential Commercial Applications
One potential commercial application of this technology could be in the production of advanced electronic devices that require precise plasma processing for manufacturing.
Possible Prior Art
Prior art in the field of plasma processing apparatus may include similar systems used in semiconductor manufacturing or other industries where plasma processing is utilized.
Unanswered Questions
1. How does the integration of raising the cover and the object to be processed in the second process improve the overall efficiency of the plasma processing apparatus? 2. Are there any specific industries or applications where this technology would be particularly beneficial, aside from semiconductor manufacturing?
Original Abstract Submitted
A plasma processing apparatus includes: a first support member for raising and lowering an object to be processed , a second support member supporting a cover , a drive part for raising and lowering the cover via the second support member . The drive part , when raising the cover from a lowered position to a raised position, in a first process, raises the second support member without raising the first support member , and thus to raise the cover without raising the object to be processed , and in a second process, raises the first and second support members and integrally, and thus to raise the cover from the beginning of the second process, and raise the object to be processed from the beginning of or after the beginning of the second process.
