18462804. CHEMICAL LIQUID AND TREATMENT METHOD simplified abstract (FUJIFILM Corporation)
Contents
CHEMICAL LIQUID AND TREATMENT METHOD
Organization Name
Inventor(s)
Yuta Shigenoi of HAIBARA-GUN (JP)
Atsushi Mizutani of Haibara-gun (JP)
Tomonori Takahashi of Haibara-gun (JP)
CHEMICAL LIQUID AND TREATMENT METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18462804 titled 'CHEMICAL LIQUID AND TREATMENT METHOD
Simplified Explanation
The patent application describes a chemical liquid that can effectively etch aluminum oxide on a substrate and has a high selectivity for etching aluminum oxide over a specific metal oxide. The liquid is alkaline and contains hydroxy acids, quaternary ammonium compounds, trialkylamines, and water.
- The chemical liquid has excellent etching ability for aluminum oxide on a substrate.
- The liquid also has excellent etching selectivity between aluminum oxide and a specific metal oxide.
- The liquid contains at least one hydroxy acid, a quaternary ammonium compound, a trialkylamine, and water.
- The liquid is alkaline in nature.
Potential Applications
- Semiconductor manufacturing: The chemical liquid can be used for etching aluminum oxide layers in the fabrication of semiconductor devices.
- Surface treatment: The liquid can be used for surface preparation and cleaning of substrates in various industries, such as electronics, automotive, and aerospace.
Problems Solved
- Etching aluminum oxide: The chemical liquid provides an effective solution for etching aluminum oxide layers on substrates.
- Selective etching: The liquid offers high selectivity for etching aluminum oxide over a specific metal oxide, enabling precise and controlled etching processes.
Benefits
- Enhanced etching ability: The chemical liquid provides excellent etching ability for aluminum oxide, ensuring efficient and precise etching processes.
- Selectivity control: The liquid offers high selectivity for etching aluminum oxide over a specific metal oxide, allowing for selective etching and avoiding damage to desired materials.
- Versatile application: The liquid can be used in various industries for different purposes, such as semiconductor manufacturing and surface treatment.
Original Abstract Submitted
Provided is a chemical liquid that has an excellent etching ability for an Al oxide on a substrate and excellent etching selectivity between Al oxide and a specific metal oxide. Also provided is a treatment method using the chemical liquid. The chemical liquid contains at least one hydroxy acid selected from the group consisting of a hydroxy acid and a salt thereof, a quaternary ammonium compound, a trialkylamine, and water, and is alkaline.
