18460759. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)

From WikiPatents
Jump to navigation Jump to search

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Organization Name

Kioxia Corporation

Inventor(s)

Fumiki Aiso of Nagoya Aichi (JP)

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18460759 titled 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Simplified Explanation

The substrate processing apparatus described in the abstract includes a boat for holding multiple substrates, a reactor for processing the substrates, and arms for transferring the substrates between different components of the apparatus.

  • The boat can accommodate substrates arranged in a specific direction.
  • The first arm can hold and transfer individual substrates between storage and processing areas.
  • The second arm has a holder for supporting multiple substrates and transferring them to the boat.

Potential Applications

The technology described in this patent application could be used in semiconductor manufacturing, solar panel production, and other industries that require precise substrate processing.

Problems Solved

This technology solves the problem of efficiently and accurately transferring substrates between storage and processing areas in a manufacturing environment.

Benefits

The benefits of this technology include increased efficiency, reduced risk of substrate damage, and improved overall manufacturing process control.

Potential Commercial Applications

A potential commercial application for this technology could be in the production of electronic devices, where precise substrate processing is crucial for product quality and performance.

Possible Prior Art

One possible prior art for this technology could be automated substrate handling systems used in semiconductor fabrication facilities.

Unanswered Questions

How does this technology improve substrate processing efficiency compared to existing systems?

This technology improves substrate processing efficiency by allowing for precise and automated transfer of substrates between different components of the processing apparatus, reducing the risk of errors and damage.

What are the specific industries that could benefit most from this technology?

Specific industries that could benefit from this technology include semiconductor manufacturing, solar panel production, and any other industry that requires precise substrate processing for their products.


Original Abstract Submitted

A substrate processing apparatus according to an embodiment includes a boat capable of accommodating a plurality of substrates taken out from a storage container, a reactor capable of housing the boat and processing the plurality of substrates, and first and second arms that transfer the plurality of substrates. The boat accommodates the substrates in a first direction intersecting surfaces of the substrates. The first arm holds both ends of one substrate in a second direction intersecting the first direction, and is capable of transferring the one substrate between the storage container and the second arm. The second arm has a first holder that can support two substrates in a third direction intersecting the first and second directions, and is capable of transferring the two substrates between the first arm and the boat.