18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
Contents
- 1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Original Abstract Submitted
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Organization Name
Inventor(s)
Naoya Hatakeyama of Haibara-gun (JP)
Hideyuki Ishihara of Haibara-gun (JP)
Akiyoshi Goto of Haibara-gun (JP)
Michihiro Shirakawa of Haibara-gun (JP)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18457908 titled 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Simplified Explanation
The patent application describes a resin composition that is sensitive to actinic rays or radiation. The composition includes a resin that becomes more polar when exposed to acid, and an ionic compound. The ionic compound can either generate acid when irradiated with actinic rays or radiation, or it can be decomposed by actinic rays or radiation to reduce acid-trapping property. The resin has a repeating unit represented by Formula (1).
- The resin composition is sensitive to actinic rays or radiation.
- The resin becomes more polar when exposed to acid.
- The ionic compound in the composition can either generate acid or be decomposed by actinic rays or radiation.
- The resin has a repeating unit represented by Formula (1).
Potential Applications
- Photolithography: The resin composition can be used in the production of microchips and other electronic devices that require precise patterning.
- 3D Printing: The composition can be used in additive manufacturing processes to create intricate structures with high resolution.
- Optical Devices: The resin composition can be used in the fabrication of lenses, optical filters, and other optical components.
Problems Solved
- Improved Sensitivity: The resin composition provides increased sensitivity to actinic rays or radiation, allowing for more precise control over the patterning process.
- Reduced Acid-Trapping: The inclusion of ionic compounds that can be decomposed by actinic rays or radiation helps to reduce the trapping of acid, leading to improved performance and reliability of the resin composition.
Benefits
- Enhanced Resolution: The resin composition's sensitivity to actinic rays or radiation allows for the creation of high-resolution patterns and structures.
- Increased Efficiency: The reduced acid-trapping property of the composition improves the efficiency of the patterning process, leading to faster production times and reduced waste.
- Versatility: The resin composition can be used in various applications, including photolithography, 3D printing, and optical device fabrication.
Original Abstract Submitted
An actinic ray-sensitive or radiation-sensitive resin composition containing, (A) a resin which is decomposed by action of acid to increase polarity; and an ionic compound, in which the ionic compound contains (B) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and (C) an ionic compound which is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, or contains (D) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, and the resin (A) has a repeating unit represented by the Formula (1).
