18454381. APPARATUS FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES AND METHOD FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
APPARATUS FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES AND METHOD FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES BY USING THE SAME
Organization Name
Inventor(s)
Sang Hyun Park of Suwon-si (KR)
Yun Bin Jeong of Suwon-si (KR)
APPARATUS FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES AND METHOD FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES BY USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18454381 titled 'APPARATUS FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES AND METHOD FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES BY USING THE SAME
Simplified Explanation
The method described in the patent application is for manufacturing analytical semiconductor samples using a specialized apparatus. Here are the key points of the innovation:
- Mounting the analytical semiconductor samples to a holder
- Discharging deionized (DI) water to an upper surface of a polishing plate through a DI water nozzle
- Grinding the analytical semiconductor samples with the upper surface of the polishing plate
- Determining if the desired viewing surface has been acquired
- Transferring the samples for analysis if the desired viewing surface has been acquired
Potential Applications: - Semiconductor manufacturing - Quality control in semiconductor industry - Research and development in semiconductor technology
Problems Solved: - Minimizing feedback time in manufacturing analytical semiconductor samples - Ensuring an environmentally friendly and large viewing surface - Improving efficiency in the analysis of semiconductor samples
Benefits: - Faster manufacturing process - Enhanced quality control - Increased productivity in semiconductor research and development
Original Abstract Submitted
There is provide a method for manufacturing analytical semiconductor samples by using an apparatus for manufacturing analytical semiconductor samples, which minimizes a feedback time by manufacturing a viewing surface that is environment-friendly and has a large area. The method comprising mounting the analytical semiconductor samples to a holder; discharging deionized (DI) water to an upper surface of a polishing plate through a DI water nozzle; grinding the analytical semiconductor samples with the upper surface of the polishing plat; determining whether a desired viewing surface of the analytical semiconductor samples has been acquired after the grinding of the analytical semiconductor samples; and transferring the analytical semiconductor samples to analyze the viewing surface of the ground analytical semiconductor samples based on a determination that the desired viewing surface of the analytical semiconductor samples has been acquired.
