18372885. THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

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THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Woosung Yang of Gwangmyeong-si (KR)

HOJUN Seong of Suwon-si (KR)

JOONHEE Lee of Seongnam-si (KR)

JOON-SUNG Lim of Seongnam-si (KR)

EUNTAEK Jung of Seongnam-si (KR)

THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18372885 titled 'THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME

Simplified Explanation

The abstract describes a semiconductor memory device that consists of two substrates, with a lower semiconductor layer and an upper semiconductor layer on top. The device also includes an electrode structure with multiple stacked electrodes, a vertical channel structure that connects to the second substrate, an interlayer dielectric layer that covers the electrode structure, and a cutting structure that penetrates the interlayer dielectric layer and the upper semiconductor layer. The upper semiconductor layer has a sidewall defined by the cutting structure, and the lower semiconductor layer has a sidewall adjacent to the upper sidewall, but horizontally offset from it.

  • The semiconductor memory device includes a vertical channel structure that connects to the second substrate, allowing for efficient data transfer.
  • The electrode structure with stacked electrodes provides a means for storing and accessing data in the memory device.
  • The cutting structure and sidewalls in the upper and lower semiconductor layers allow for precise and controlled electrical connections within the device.

Potential Applications:

  • This semiconductor memory device can be used in various electronic devices, such as smartphones, tablets, and computers, to provide efficient and reliable data storage and retrieval.
  • It can also be utilized in data centers and servers to enhance the performance and capacity of memory systems.

Problems Solved:

  • The device solves the problem of limited data storage and slow data transfer in conventional memory devices.
  • It addresses the challenge of achieving precise and controlled electrical connections within a semiconductor memory device.

Benefits:

  • The semiconductor memory device offers increased data storage capacity and faster data transfer rates.
  • It provides improved reliability and efficiency in data storage and retrieval.
  • The device allows for more precise and controlled electrical connections, enhancing overall performance.


Original Abstract Submitted

Disclosed is a semiconductor memory device comprising a second substrate on a first substrate and including a lower semiconductor layer and an upper semiconductor layer on the lower semiconductor layer, an electrode structure on the upper semiconductor layer and including a plurality of stacked electrodes, a vertical channel structure that penetrates the electrode structure and is connected to the second substrate, an interlayer dielectric layer that covers the electrode structure, and a cutting structure that penetrates the interlayer dielectric layer and the upper semiconductor layer. The upper semiconductor layer has a first sidewall defined by the cutting structure. The lower semiconductor layer has a second sidewall adjacent to the first sidewall. The first sidewall and the second sidewall are horizontally offset from each other.