18364521. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Sangcheol Na of Suwon-si (KR)

Kyoungwoo Lee of Suwon-si (KR)

Minchan Gwak of Suwon-si (KR)

Gukhee Kim of Suwon-si (KR)

Youngwoo Kim of Suwon-si (KR)

Dongick Lee of Suwon-si (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18364521 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The semiconductor device described in the patent application includes:

  • Substrate with a fin-type active pattern
  • Source/drain regions on the fin-type active pattern
  • Interlayer insulating layer on the isolation insulating layer
  • Contact structure electrically connected to the source/drain regions
  • Buried conductive structure connected to the contact structure and buried in the interlayer insulating layer
  • Power delivery structure penetrating the substrate and in contact with the buried conductive structure
  • First contact plug and first conductive barrier in the buried conductive structure
  • Second contact plug in direct contact with the bottom surface of the first contact plug

Potential applications of this technology:

  • Semiconductor devices
  • Integrated circuits
  • Electronics manufacturing

Problems solved by this technology:

  • Improved electrical connectivity
  • Enhanced power delivery
  • Increased efficiency in semiconductor devices

Benefits of this technology:

  • Higher performance
  • Better reliability
  • Increased functionality


Original Abstract Submitted

A semiconductor device includes a substrate having a fin-type active pattern, source/drain regions on the fin-type active pattern, an interlayer insulating layer on the isolation insulating layer, and on the source/drain region, a contact structure electrically connected to the source/drain regions, a buried conductive structure electrically connected to the contact structure and buried in the interlayer insulating layer, and a power delivery structure that penetrates the substrate, and is in contact with a bottom surface of the buried conductive structure. The buried conductive structure includes a first contact plug, and a first conductive barrier on a side surface of the first contact plug and spaced apart from a bottom surface of the first contact plug. The power delivery structure includes a second contact plug in direct contact with the bottom surface of the first contact plug.