18347817. LASER CRYSTALLIZATION MONITORING DEVICE AND METHOD OF LASER CRYSTALLIZATION MONITORING USING THE SAME simplified abstract (Samsung Display Co., Ltd.)
Contents
- 1 LASER CRYSTALLIZATION MONITORING DEVICE AND METHOD OF LASER CRYSTALLIZATION MONITORING USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 LASER CRYSTALLIZATION MONITORING DEVICE AND METHOD OF LASER CRYSTALLIZATION MONITORING USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
LASER CRYSTALLIZATION MONITORING DEVICE AND METHOD OF LASER CRYSTALLIZATION MONITORING USING THE SAME
Organization Name
Inventor(s)
LASER CRYSTALLIZATION MONITORING DEVICE AND METHOD OF LASER CRYSTALLIZATION MONITORING USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18347817 titled 'LASER CRYSTALLIZATION MONITORING DEVICE AND METHOD OF LASER CRYSTALLIZATION MONITORING USING THE SAME
Simplified Explanation
The patent application describes a laser crystallization monitoring device that includes a stage for supporting a substrate, a laser beam generator, a mirror, telecentric f-theta lenses, and a monitor for inspecting the laser beam passing through the lenses.
- Stage for supporting substrate
- Laser beam generator emitting laser beam
- Mirror rotating around rotation axis to reflect laser beam
- First telecentric f-theta lens on laser beam path
- Second telecentric f-theta lens for reflected laser beam
- Monitor for inspecting laser beam
Potential Applications
The technology can be used in the manufacturing of electronic devices, such as displays, sensors, and solar cells, where precise crystallization of materials is required.
Problems Solved
The device helps in monitoring and controlling the crystallization process of materials using a laser beam, ensuring accuracy and efficiency in the manufacturing process.
Benefits
- Improved quality and uniformity of crystallized materials - Real-time monitoring and control of the crystallization process - Increased productivity and efficiency in manufacturing processes
Potential Commercial Applications
Optimizing Laser Crystallization Monitoring Device for Enhanced Manufacturing Processes
Possible Prior Art
Prior art may include similar devices used in the semiconductor industry for laser crystallization processes.
Unanswered Questions
How does the device handle variations in substrate materials and thicknesses?
The patent application does not provide details on how the device adjusts for different substrate materials and thicknesses to ensure accurate monitoring and control of the crystallization process.
What is the maximum size of substrates that can be accommodated by the device?
The patent application does not specify the maximum size of substrates that can be supported and monitored by the device, which could impact its scalability and versatility in different manufacturing settings.
Original Abstract Submitted
A laser crystallization monitoring device includes a stage that supports a substrate, a laser beam generator that emits a laser beam to the substrate, a mirror that reflects the laser beam emitted from the laser beam generator and that rotates around a rotation axis, a first telecentric f-theta lens located on the laser beam path between the mirror and the substrate, a second telecentric f-theta lens through which the laser beam reflected from the substrate passes, and a monitor that inspects the laser beam passing through the second telecentric f-theta lens.
