18334063. BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM simplified abstract (Applied Materials, Inc.)
Contents
BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM
Organization Name
Inventor(s)
Tiefeng Shi of Santa Clara CA (US)
Gang Fu of Santa Clara CA (US)
Keith A. Miller of Mountain View CA (US)
BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18334063 titled 'BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM
Simplified Explanation
The abstract describes a patent application for dynamic impedance matching across multiple frequency bands of a power source in plasma processing systems. Here is a simplified explanation of the patent:
- Amplifying a broadband signal
- Splitting the signal across multiple channel paths
- Adjusting impedance to achieve desired values based on feedback
- Impedance matching network includes multiple circuits
- Circuits are coupled to plasma excitation circuitry and channel paths
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- Potential Applications of this Technology
This technology could be applied in industries such as semiconductor manufacturing, solar panel production, and medical device manufacturing where plasma processing is used.
- Problems Solved by this Technology
This technology solves the problem of efficiently matching impedance across multiple frequency bands in plasma processing systems, leading to improved performance and reliability.
- Benefits of this Technology
The benefits of this technology include enhanced plasma processing efficiency, increased system reliability, and improved overall performance of plasma processing systems.
- Potential Commercial Applications of this Technology
One potential commercial application of this technology could be in the development of advanced plasma etching systems for semiconductor fabrication, which require precise impedance matching for optimal performance.
- Possible Prior Art
Prior art in the field of plasma processing systems may include patents or publications related to impedance matching techniques, plasma excitation circuitry, and broadband signal amplification in similar applications.
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- Unanswered Questions
- How does this technology compare to existing impedance matching methods in plasma processing systems?
This article does not provide a direct comparison to existing impedance matching methods in plasma processing systems, leaving the reader to wonder about the specific advantages and limitations of this new approach.
- What are the specific threshold values used for adjusting impedance in this technology?
The abstract mentions adjusting impedance to achieve a second impedance within a threshold value, but does not specify the exact threshold values or how they are determined in practice.
Original Abstract Submitted
Embodiments provided herein generally include apparatus, plasma processing systems and methods for dynamic impedance matching across multiple frequency bands of a power source. An example method includes amplifying a broadband signal, splitting the amplified broadband signal across a plurality of channel paths coupled to an impedance matching network, and adjusting at least one first impedance associated with the impedance matching network to achieve a second impedance within a threshold value based at least in part on feedback associated with the broadband signal. The impedance matching network includes a plurality of impedance matching circuits coupled to plasma excitation circuitry, and each of the impedance matching circuits is coupled to a different path of the plurality of channel paths and an output node.
