18317387. SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
Contents
- 1 SEMICONDUCTOR MEASUREMENT APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Enhancing Semiconductor Manufacturing Processes
- 1.6 How does the controller determine the optimal exposure times for the camera based on the different wavelength bands of light emitted by the illuminator?
- 1.7 What types of structures within the test object can be accurately measured using this apparatus?
- 1.8 Original Abstract Submitted
SEMICONDUCTOR MEASUREMENT APPARATUS
Organization Name
Inventor(s)
SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18317387 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS
Simplified Explanation
The semiconductor measurement apparatus described in the abstract is designed to measure structures within a test object using light of different wavelengths. Here is a simplified explanation of the patent application:
- The apparatus includes an illuminator that emits light of two different wavelength bands.
- A camera captures the light reflected, scattered, or transmitted by the test object.
- A controller manages the illuminator and camera, adjusting exposure times based on the wavelength of light being emitted.
Potential Applications of this Technology:
- Semiconductor manufacturing
- Quality control in electronics production
- Material analysis in research and development
Problems Solved by this Technology:
- Accurate measurement of structures within semiconductor devices
- Enhanced imaging capabilities for quality assurance
- Streamlined testing processes in manufacturing
Benefits of this Technology:
- Improved precision in semiconductor analysis
- Increased efficiency in testing procedures
- Enhanced product quality in electronics manufacturing
Potential Commercial Applications of this Technology:
Enhancing Semiconductor Manufacturing Processes
Possible Prior Art: There are existing semiconductor measurement devices that use single wavelength light sources and cameras, but the use of dual wavelength bands for improved accuracy may be a novel feature in this patent application.
Unanswered Questions:
How does the controller determine the optimal exposure times for the camera based on the different wavelength bands of light emitted by the illuminator?
The abstract does not provide specific details on the algorithm or method used by the controller to adjust exposure times.
What types of structures within the test object can be accurately measured using this apparatus?
The abstract mentions measuring a "plurality of structures" but does not specify the exact nature of these structures or their size limitations.
Original Abstract Submitted
A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. The controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band.
