18299301. PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME
Organization Name
Inventor(s)
Byungchul Yoo of Suwon-si (KR)
Changyoung Jeong of Suwon-si (KR)
PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18299301 titled 'PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME
Simplified Explanation
The abstract describes a method of manufacturing a pellicle for extreme ultraviolet exposure. The method involves forming a graphite-containing layer on a catalyst substrate, surface-treating the first surface of the graphite-containing layer to create a first treatment layer, and forming a first passivation layer on the first treatment layer. The surface treatment of the first surface removes a C—O—C bond present in the graphite-containing layer.
- The method involves forming a graphite-containing layer on a catalyst substrate.
- The first surface of the graphite-containing layer is surface-treated to create a first treatment layer.
- A first passivation layer is formed on the first treatment layer.
- The surface treatment of the first surface removes a C—O—C bond in the graphite-containing layer.
Potential applications of this technology:
- Manufacturing pellicles for extreme ultraviolet exposure in industries such as semiconductor manufacturing, lithography, and nanotechnology.
Problems solved by this technology:
- The method provides a way to manufacture pellicles for extreme ultraviolet exposure with improved properties and performance.
- The surface treatment removes a C—O—C bond, which may enhance the durability and stability of the pellicle.
Benefits of this technology:
- Improved durability and stability of the pellicle.
- Enhanced performance in extreme ultraviolet exposure applications.
- Potential for increased efficiency and reliability in semiconductor manufacturing processes.
Original Abstract Submitted
A method of manufacturing a pellicle for an extreme ultraviolet exposure includes forming a graphite-containing layer on a catalyst substrate; surface-treating a first surface of the graphite-containing layer to form a first treatment layer; and forming a first passivation layer on the first treatment layer, wherein the forming of the first treatment layer includes removing a C—O—C bond included in the graphite-containing layer through the surface-treating of the first surface.
