18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME
Organization Name
Inventor(s)
Jong-San Chang of Suwon-si (KR)
GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18230880 titled 'GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME
Simplified Explanation
The abstract describes a gas treatment system that consists of three components: a first scrubber, a catalytic reactor, and a second scrubber. The first scrubber treats gas exhausted from a process chamber, and the catalytic reactor treats the gas passing through the first scrubber. The second scrubber treats the gas passing through the catalytic reactor. The catalytic reactor includes a fluidized bed reactor (FBR).
- The gas treatment system includes a first scrubber, a catalytic reactor, and a second scrubber.
- The first scrubber treats gas exhausted from a process chamber.
- The catalytic reactor treats the gas passing through the first scrubber.
- The second scrubber treats the gas passing through the catalytic reactor.
- The catalytic reactor incorporates a fluidized bed reactor (FBR).
Potential Applications:
- Industrial gas treatment: The system can be used to treat gas exhausted from various industrial processes, such as manufacturing or chemical production.
- Environmental control: It can be employed to remove pollutants or harmful substances from gas emissions, contributing to air quality improvement.
Problems Solved:
- Gas purification: The system effectively removes impurities and contaminants from the gas, ensuring cleaner emissions and reducing environmental impact.
- Process chamber exhaust treatment: The first scrubber efficiently treats the gas exhausted from the process chamber, preventing the release of harmful substances into the environment.
Benefits:
- Enhanced gas treatment: The combination of the first scrubber, catalytic reactor, and second scrubber provides a comprehensive gas treatment solution, ensuring thorough purification.
- Versatile application: The system can be adapted to various industries and processes, offering flexibility in addressing different gas treatment needs.
- Environmental protection: By effectively treating gas emissions, the system helps reduce pollution and protect the environment.
Original Abstract Submitted
A gas treatment system includes a first scrubber configured to treat a gas exhausted from a process chamber, a catalytic reactor connected to the first scrubber and configured to treat a gas passing through the first scrubber, and a second scrubber connected to the catalytic reactor and configured to treat a gas passing through the catalytic reactor, where the catalytic reactor includes a fluidized bed reactor (FBR).
