18224312. DEPOSITION APPARATUS simplified abstract (Samsung Display Co., Ltd.)
Contents
- 1 DEPOSITION APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 DEPOSITION APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
DEPOSITION APPARATUS
Organization Name
Inventor(s)
DEPOSITION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18224312 titled 'DEPOSITION APPARATUS
Simplified Explanation
The deposition apparatus described in the abstract includes a chamber with a gate for loading and unloading substrates, and a susceptor with hot-wires arranged asymmetrically for independent control.
- The deposition apparatus includes a chamber with a gate for loading and unloading substrates.
- The susceptor in the apparatus has hot-wires arranged asymmetrically for independent control.
Potential Applications
The technology could be used in semiconductor manufacturing, thin film deposition, and other industries requiring precise control over deposition processes.
Problems Solved
This technology solves the problem of uniform and controlled deposition of materials on substrates, allowing for high-quality thin film production.
Benefits
The benefits of this technology include improved deposition control, increased efficiency in thin film production, and enhanced overall product quality.
Potential Commercial Applications
The technology could be applied in the production of solar panels, electronic devices, and other high-tech products requiring thin film coatings.
Possible Prior Art
One possible prior art in this field is the use of traditional deposition apparatus with limited control over the deposition process.
Unanswered Questions
1. How does the independent control of hot-wires improve the deposition process compared to traditional methods? 2. Are there any limitations to the size or type of substrates that can be used with this deposition apparatus?
Original Abstract Submitted
A deposition apparatus includes a chamber providing an inner space, a gate disposed on one side of the chamber and opening and closing the chamber to allow a substrate to be loaded and unloaded therethrough, and a susceptor including one surface on which the substrate is seated. The susceptor includes a susceptor body including a first region and a second region disposed in a first direction farther away from the gate than the first region, a first hot-wire arranged in a first pattern in the first region, and a second hot-wire arranged in a second pattern in the first and second regions. The first and second hot-wires is asymmetric with respect to a second direction crossing the center of the susceptor body in a plan view and orthogonal to the first direction, and the first and second hot-wires may be controlled independently.
