18215437. LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Sungho Jang of Suwon-si (KR)

Sangwoo Bae of Suwon-si (KR)

Minhwan Seo of Suwon-si (KR)

Jangwoon Sung of Suwon-si (KR)

Akinori Okubo of Suwon-si (KR)

Seungwoo Lee of Suwon-si (KR)

Jungchul Lee of Suwon-si (KR)

Jaehwang Jung of Suwon-si (KR)

Sangjoon Hong of Suwon-si (KR)

LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18215437 titled 'LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Simplified Explanation

The patent application describes a level sensor used to detect the height level of a substrate in a substrate processing apparatus. The sensor utilizes a measurement light source, a prism to split reflected light, an optical path length modulator, and a detector to detect the optical path length difference between the polarized lights.

• Measurement light source radiates light towards the substrate.
• Prism splits reflected light into first and second polarized light.
• Prism generates a first optical path length difference between the polarized lights.
• Optical path length modulator keeps constant the path length of the first polarized light and periodically changes the path length of the second polarized light.
• Detector detects the optical path length difference based on interference signal between the polarized lights.

Potential Applications

The technology can be used in various industries such as semiconductor manufacturing, pharmaceuticals, and chemical processing for accurate level sensing and monitoring.

Problems Solved

1. Accurate detection of substrate height levels. 2. Improved process control and automation in substrate processing.

Benefits

1. Enhanced precision in height level detection. 2. Increased efficiency in substrate processing. 3. Reduced risk of errors and inconsistencies in measurements.

Potential Commercial Applications

Optical level sensors can be integrated into manufacturing equipment, chemical reactors, and storage tanks for precise monitoring and control of liquid levels.

Possible Prior Art

One possible prior art could be traditional level sensors using ultrasonic or capacitive technology for height level detection in industrial applications.

What are the limitations of the current technology?

The current technology may have limitations in terms of accuracy and reliability in detecting very small height level differences.

How does this innovation compare to similar technologies in the market?

This innovation offers a more precise and reliable method of detecting substrate height levels compared to traditional sensors, potentially leading to improved process efficiency and control.

Original Abstract Submitted

Provided are a level sensor configured to detect a height level of a substrate, and a substrate processing apparatus including the level sensor. The level sensor includes a measurement light source configured to radiate measurement light toward the substrate, a prism configured to split reflected light of the measurement light into first polarized light and second polarized light and generate a first optical path length difference between the first polarized light and the second polarized light, an optical path length modulator configured to keep constant an optical path length of the first polarized light and periodically change an optical path length of the second polarized light, and a detector configured to detect the first optical path length difference based on an interference signal between the first polarized light and the second polarized light.