18188952. DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME simplified abstract (Samsung Display Co., LTD.)

From WikiPatents
Jump to navigation Jump to search

DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME

Organization Name

Samsung Display Co., LTD.

Inventor(s)

KYONG-CHOL Lee of Yongin-si (KR)

YUNJONG Yeo of Yongin-si (KR)

TAESUNG Kim of Yongin-si (KR)

HYUNMIN Cho of Yongin-si (KR)

YEONHONG Kim of Yongin-si (KR)

DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18188952 titled 'DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME

Simplified Explanation

The patent application describes a display device with multiple transistors and insulating patterns for improved performance.

  • First transistor with a first active pattern and first oxide semiconductor
  • Second transistor with a second active pattern and a different oxide semiconductor
  • Insulating patterns between active patterns and gate electrodes
  • Direct contact between third gate insulating pattern, first active pattern, and first gate electrode

---

      1. Potential Applications
  • High-resolution displays
  • Flexible displays
  • Wearable technology
  • Augmented reality devices
      1. Problems Solved
  • Improved performance of display devices
  • Enhanced reliability and durability
  • Reduction of signal interference
      1. Benefits
  • Higher quality display resolution
  • Increased device flexibility
  • Extended device lifespan
  • Enhanced user experience


Original Abstract Submitted

A display device includes a first transistor including a first active pattern including a first oxide semiconductor, and a first gate electrode which is on the first active pattern, a second transistor including a second active pattern including a second oxide semiconductor different from the first oxide semiconductor, and a second gate electrode which is on the second active pattern, a first gate insulating pattern between the second active pattern and the second gate electrode, a second gate insulating pattern facing the first gate insulating pattern with the second active pattern therebetween, and a third gate insulating pattern between the first active pattern and the first gate electrode, the third gate insulating pattern directly contacting the first active pattern and the first gate electrode.