18167666. EXPOSURE MASK AND DISPLAY DEVICE MANUFACTURED BY USING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)

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EXPOSURE MASK AND DISPLAY DEVICE MANUFACTURED BY USING THE SAME

Organization Name

SAMSUNG DISPLAY CO., LTD.

Inventor(s)

Dong Hee Shin of Asan-si (KR)

EXPOSURE MASK AND DISPLAY DEVICE MANUFACTURED BY USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18167666 titled 'EXPOSURE MASK AND DISPLAY DEVICE MANUFACTURED BY USING THE SAME

Simplified Explanation

The abstract describes a display device with a display area, a first peripheral area, and a second peripheral area. Different column spacers are placed in each area, and the patterns of the exposure mask used in the peripheral areas may differ.

  • A display device with a display area and two peripheral areas
  • Different column spacers are used in each area
  • The patterns of the exposure mask may vary in the peripheral areas

Potential applications of this technology:

  • Consumer electronics such as smartphones, tablets, and televisions
  • Computer monitors and laptops
  • Automotive displays and infotainment systems

Problems solved by this technology:

  • Allows for more precise control and optimization of the display quality
  • Helps to reduce manufacturing defects and improve overall display performance

Benefits of this technology:

  • Enhanced display quality and visual experience for users
  • Improved manufacturing efficiency and yield
  • Enables customization and flexibility in display design and production


Original Abstract Submitted

A display device includes: a display area including a plurality of pixels; a first peripheral area disposed at one side of the display area; and a second peripheral area disposed at the opposite side of the display area, wherein a first column spacer is disposed in the display area, a second column spacer is disposed in the first peripheral area, and a third column spacer is disposed in the second peripheral area. The patterns of an exposure mask utilized in the first peripheral area in which the second column spacer is disposed and the second peripheral area in which the third column spacer is disposed may be different from each other.