18158679. MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK simplified abstract (Samsung Display Co., Ltd.)

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MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK

Organization Name

Samsung Display Co., Ltd.

Inventor(s)

YOUNGMIN Moon of Yongin-si (KR)

MINHO Moon of Seongnam-si (KR)

SEUNGYONG Song of Suwon-si (KR)

SUNGSOON Im of Suwon-si (KR)

MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK - A simplified explanation of the abstract

This abstract first appeared for US patent application 18158679 titled 'MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK

Simplified Explanation

The patent application describes a mask assembly consisting of a mask frame and a deposition mask.

  • The mask frame has a first opening and a front surface, while the deposition mask has multiple second openings.
  • The deposition mask is attached to the front surface of the mask frame.
  • The mask frame is oriented in a way that the front surface extends along the direction of gravity.
  • The deposition mask includes an initial mask with the second openings, which is attached to the front surface of the mask frame.
  • The first opening of the mask frame aligns with all the second openings of the initial mask along the direction of gravity.

Potential applications of this technology:

  • Semiconductor manufacturing: The mask assembly can be used in the deposition process of semiconductor materials.
  • Microelectronics: It can be utilized in the fabrication of microelectronic devices.
  • Optical coatings: The mask assembly can be employed in the production of optical coatings for lenses and mirrors.

Problems solved by this technology:

  • Alignment accuracy: The design ensures precise alignment between the first opening and the second openings, improving the accuracy of the deposition process.
  • Gravity-assisted deposition: The orientation of the mask frame allows for better control and uniformity of the deposition process.

Benefits of this technology:

  • Improved efficiency: The accurate alignment and gravity-assisted deposition result in higher efficiency and yield in manufacturing processes.
  • Cost savings: The technology reduces material waste and improves the overall productivity of the deposition process.
  • Enhanced product quality: The precise alignment and control provided by the mask assembly contribute to the production of high-quality semiconductor and microelectronic devices.


Original Abstract Submitted

A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.

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