18155536. SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

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SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Shih-Wei Peng of Hsinchu City (TW)

Jiann-Tyng Tzeng of Hsinchu City (TW)

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18155536 titled 'SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Simplified Explanation

The patent application describes a semiconductor device that includes a first cell surrounded by a castle-shaped forbidden region. The first cell consists of a first active region, a second active region, and at least one via. The first and second active regions extend in one direction and are separated from each other in a perpendicular direction. The first active region partially overlaps the upper region of the forbidden region, while the second active region partially overlaps the lower region. The via is positioned outside the forbidden region.

  • The semiconductor device includes a first cell with specific active regions and vias.
  • The first cell is surrounded by a castle-shaped forbidden region.
  • The active regions extend in one direction and are separated in a perpendicular direction.
  • The first active region overlaps the upper region of the forbidden region, while the second active region overlaps the lower region.
  • The vias are arranged outside the forbidden region.

Potential Applications

This technology can be applied in various semiconductor devices, including integrated circuits and microprocessors.

Problems Solved

The castle-shaped forbidden region helps to prevent interference and cross-talk between the active regions, improving the overall performance and reliability of the semiconductor device.

Benefits

- Enhanced performance and reliability of the semiconductor device. - Reduced interference and cross-talk between active regions. - Improved integration and miniaturization of semiconductor devices.


Original Abstract Submitted

A semiconductor device includes a first cell. The first cell is surrounded by a castle-shaped forbidden region. The first cell includes a first active region, a second active region, and at least one via. The first active region and the second active region extend along a first direction and are separated from each other along a second direction traverse to the first direction. The first active region partially overlaps an upper region of the castle-shaped forbidden region, and the second active region partially overlaps a lower region of the castle-shaped forbidden region. The at least one via is arranged outside the castle-shaped forbidden region.

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