18152976. SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND METHOD OF MANUFACTURING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND METHOD OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
Junyoung Kwon of Suwon-si (KR)
Kyung-Eun Byun of Suwon-si (KR)
SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18152976 titled 'SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND METHOD OF MANUFACTURING THE SAME
Simplified Explanation
The abstract of the patent application describes a semiconductor device that includes a two-dimensional material layer, metal islands on the two-dimensional material layer, and a metal layer covering the metal islands. The device is manufactured by forming metal islands on the two-dimensional material layer using a redox method and then forming a metal layer to cover the islands.
- The semiconductor device includes a two-dimensional material layer.
- Metal islands are formed on the two-dimensional material layer.
- A metal layer is formed to cover the metal islands.
- The device is manufactured using a redox method.
Potential Applications:
- This technology can be used in the manufacturing of semiconductor devices.
- It can be applied in the development of advanced electronic devices.
- The metal islands and metal layer can enhance the performance and functionality of the semiconductor device.
Problems Solved:
- The technology solves the problem of improving the performance and functionality of semiconductor devices.
- It addresses the need for more efficient manufacturing methods for semiconductor devices.
- It provides a solution for incorporating two-dimensional materials into semiconductor devices.
Benefits:
- The use of metal islands and a metal layer can enhance the conductivity and performance of the semiconductor device.
- The manufacturing method using a redox method may offer a more efficient and cost-effective approach.
- The incorporation of two-dimensional materials can enable the development of advanced electronic devices with improved properties.
Original Abstract Submitted
A semiconductor device may include a two-dimensional material layer, one or more metal islands on the two-dimensional material layer, and a metal layer covering the metal islands on the two-dimensional material layer. The semiconductor device may be manufactured by a method including forming metal islands on a two-dimensional material layer using a redox method and forming a metal layer covering the metal islands on the two-dimensional material layer.
