18143340. ELECTROSTATIC CHUCK simplified abstract (SAMSUNG DISPLAY CO., LTD.)
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Contents
ELECTROSTATIC CHUCK
Organization Name
Inventor(s)
Hyoseung Kim of Yongin-si (KR)
ELECTROSTATIC CHUCK - A simplified explanation of the abstract
This abstract first appeared for US patent application 18143340 titled 'ELECTROSTATIC CHUCK
Simplified Explanation
The abstract describes an electrostatic chuck that includes an adsorption area, an outer area, and a detection pattern.
- The electrostatic chuck has an electrode pattern in the adsorption area where an object can be adsorbed.
- The outer area surrounds the adsorption area.
- A detection pattern is placed in the outer area and surrounds at least a portion of the adsorption area.
Potential Applications
- Semiconductor manufacturing: The electrostatic chuck can be used in the production of semiconductors, where precise and secure holding of objects is required.
- Flat panel display manufacturing: The technology can be applied in the production of flat panel displays, ensuring stable and accurate positioning of objects during the manufacturing process.
Problems Solved
- Secure object adsorption: The electrostatic chuck provides a reliable and efficient method for adsorbing objects, preventing them from moving or shifting during various manufacturing processes.
- Detection of object position: The detection pattern allows for the accurate detection and monitoring of the position of the object being held, ensuring precise control and alignment.
Benefits
- Improved manufacturing efficiency: The electrostatic chuck enables stable and secure holding of objects, reducing the risk of errors or damage during manufacturing processes and increasing overall efficiency.
- Enhanced precision: The detection pattern allows for precise monitoring and control of the object's position, ensuring accurate alignment and reducing the likelihood of misalignment or errors.
Original Abstract Submitted
An embodiment provides an electrostatic chuck including: an adsorption area in which an electrode pattern is disposed and to which an object is adsorbed; an outer area around the adsorption area; and a detection pattern disposed in the outer area and surrounding at least a portion of the adsorption area.
