18124954. SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS, AND SEMICONDUCTOR EQUIPMENT INCLUDING THE SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS, AND SEMICONDUCTOR EQUIPMENT INCLUDING THE SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Taekjin Kim of Suwon-si (KR)

Meehyun Lim of Suwon-si (KR)

Sungyeol Kim of Suwon-si (KR)

Junbum Park of Suwon-si (KR)

Sungyoung Yoon of Suwon-si (KR)

Jinyeong Yun of Suwon-si (KR)

Jungchul Lee of Suwon-si (KR)

Sungyong Lim of Suwon-si (KR)

Sunghwi Cho of Suwon-si (KR)

SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS, AND SEMICONDUCTOR EQUIPMENT INCLUDING THE SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18124954 titled 'SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS, AND SEMICONDUCTOR EQUIPMENT INCLUDING THE SEMICONDUCTOR EQUIPMENT MONITORING APPARATUS

Simplified Explanation

The patent application describes a semiconductor equipment monitoring apparatus with a wafer-type sensor inside a process chamber to sense the plasma state, a light detector and analyzer to detect and analyze light sensed by the sensor, and a light coupler to transmit the light to the detector and analyzer. The wafer-type sensor includes multiple sensors with passive elements.

• The apparatus includes a wafer-type sensor inside a process chamber to monitor the plasma state.
• A light detector and analyzer are used to detect and analyze the light sensed by the wafer-type sensor.
• A light coupler transmits the light sensed by the wafer-type sensor to the light detector and analyzer.
• The wafer-type sensor consists of multiple sensors, each containing a passive element.

1. 1. 1. Potential Applications

- Semiconductor manufacturing processes - Plasma etching and deposition processes - Thin film deposition processes

1. 1. 1. Problems Solved

- Monitoring and controlling plasma state in semiconductor equipment - Ensuring process stability and quality - Improving overall equipment efficiency

1. 1. 1. Benefits

- Real-time monitoring of plasma state - Enhanced process control and optimization - Improved product quality and yield - Reduced downtime and maintenance costs

Original Abstract Submitted

A semiconductor equipment monitoring apparatus including a wafer-type sensor inside a process chamber and configured to sense a plasma state inside the process chamber; a light detector and analyzer configured to detect and analyze light sensed by the wafer-type sensor; and a light coupler between the wafer-type sensor and the light detector and analyzer and configured to transmit the light sensed by the wafer-type sensor to the light detector and analyzer. The wafer-type sensor includes a plurality of sensors each comprising a passive element.