18110950. SEMICONDUCTOR DEVICES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SEMICONDUCTOR DEVICES
Organization Name
Inventor(s)
Kyung Bin Chun of Suwon-si (KR)
SEMICONDUCTOR DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 18110950 titled 'SEMICONDUCTOR DEVICES
Simplified Explanation
The patent application describes a semiconductor device that offers improved performance and reliability. Here are the key points:
- The semiconductor device includes a lower pattern extending in one direction and multiple sheet patterns spaced apart from the lower pattern in a perpendicular direction.
- A series of gate structures are present on the lower pattern and spaced apart in the first direction.
- The source/drain pattern consists of a semiconductor liner film and a semiconductor filling film on top of it.
- The semiconductor liner film forms a liner recess with width extension regions along its inner surface.
- The width of each width extension region increases and then decreases as you move away from the upper surface of the lower pattern.
Potential applications of this technology:
- This semiconductor device can be used in various electronic devices such as smartphones, tablets, computers, and other consumer electronics.
- It can also be utilized in industrial applications like automotive electronics, aerospace systems, and telecommunications equipment.
Problems solved by this technology:
- The improved design of the semiconductor device enhances its performance and reliability.
- The width extension regions in the liner recess help optimize the electrical characteristics of the device, leading to better functionality.
Benefits of this technology:
- The semiconductor device offers improved performance compared to existing devices.
- The increased reliability of the device ensures longer lifespan and reduced failure rates.
- The optimized electrical characteristics result in enhanced functionality and efficiency.
Original Abstract Submitted
A semiconductor device having improved performance and reliability. The semiconductor device may include a lower pattern extending in a first direction, and a plurality of sheet patterns spaced apart from the lower pattern in a second direction perpendicular to the first direction. A plurality of gate structures may be on the lower pattern and spaced apart in the first direction, and a source/drain pattern, which may include a semiconductor liner film and a semiconductor filling film on the semiconductor liner film. A liner recess that is defined by an inner surface of the semiconductor liner film may include a plurality of width extension regions, and a width of each width extension region in the first direction may increase and then decreases, as a distance increases in the second direction from an upper surface of the lower pattern.
