18098174. SEMICONDUCTOR DEVICES INCLUDING SEMICONDUCTOR PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SEMICONDUCTOR DEVICES INCLUDING SEMICONDUCTOR PATTERN
Organization Name
Inventor(s)
Huijung Kim of Seongnam-si (KR)
Satoru Yamada of Yongin-si (KR)
Sungwon Yoo of Hwaseong-si (KR)
Jaeho Hong of Hwaseong-si (KR)
SEMICONDUCTOR DEVICES INCLUDING SEMICONDUCTOR PATTERN - A simplified explanation of the abstract
This abstract first appeared for US patent application 18098174 titled 'SEMICONDUCTOR DEVICES INCLUDING SEMICONDUCTOR PATTERN
Simplified Explanation
The patent application describes a semiconductor device that includes two conductive lines with a semiconductor pattern in between. The semiconductor pattern consists of different regions with different types of impurities.
- The semiconductor device has a first conductive line and a second conductive line, with a semiconductor pattern in between.
- The semiconductor pattern includes a first semiconductor pattern with impurities adjacent to the first conductive line, and a second semiconductor pattern with different impurities adjacent to the second conductive line.
- A third semiconductor pattern is placed between the first and second semiconductor patterns, consisting of a first region adjacent to the first semiconductor pattern and a second region between the first region and the second semiconductor pattern.
- The first and second regions of the third semiconductor pattern may contain an intrinsic semiconductor layer.
- The first and second regions are crossed by first and second gate lines, respectively.
Potential applications of this technology:
- This semiconductor device can be used in various electronic devices, such as smartphones, tablets, and computers.
- It can be utilized in integrated circuits and microprocessors to enhance their performance and efficiency.
Problems solved by this technology:
- The semiconductor device provides a more efficient and compact design by utilizing different regions with specific impurities.
- It allows for better control and manipulation of electrical currents within the device.
Benefits of this technology:
- Improved performance and efficiency of electronic devices.
- Enhanced functionality and reliability of integrated circuits and microprocessors.
- Compact design, leading to smaller and more portable electronic devices.
Original Abstract Submitted
A semiconductor device includes a first conductive line and a second conductive line spaced apart from the first conductive line. A semiconductor pattern is disposed between the first conductive line and the second conductive line. The semiconductor pattern includes a first semiconductor pattern having first-conductivity-type impurities disposed adjacent to the first conductive line. A second semiconductor pattern having second-conductivity-type impurities is disposed adjacent to the second conductive line. A third semiconductor pattern is disposed between the first semiconductor pattern and the second semiconductor pattern. The third semiconductor pattern includes a first region disposed adjacent to the first semiconductor pattern and a second region disposed between the first region and the second semiconductor pattern. At least one of the first region and the second region comprises an intrinsic semiconductor layer. A first gate line crosses the first region and a second gate line crosses the second region.
