18097592. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Kyoung-Hee Kim of Hwaseong-si (KR)

Woo Choel Noh of Hwaseong-si (KR)

Ik Soo Kim of Yongin-si (KR)

Jun Kwan Kim of Seoul (KR)

Jinsub Kim of Seoul (KR)

Yongjin Shin of Yongin-si (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18097592 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The patent application describes a semiconductor device that includes a substrate with a cell array region and a peripheral circuit region. It also includes a cell transistor and a peripheral transistor on their respective regions of the substrate. The device further comprises two interconnection layers, with the first layer connected to the cell transistor and the second layer connected to the peripheral transistor. An interlayer dielectric layer covers the first interconnection layer, and a blocking layer is spaced apart from the first interconnection layer, covering the top surface and sidewall of the second interconnection layer.

  • The device includes a cell transistor and a peripheral transistor on the same substrate, allowing for integrated circuit functionality.
  • The use of two interconnection layers provides efficient connectivity between the transistors and other components of the device.
  • The interlayer dielectric layer and blocking layer help protect the interconnection layers and improve the overall performance and reliability of the device.

Potential Applications

  • This semiconductor device can be used in various electronic devices, such as smartphones, tablets, and computers.
  • It can also be applied in automotive electronics, industrial control systems, and communication devices.

Problems Solved

  • The integration of cell and peripheral transistors on the same substrate allows for compact and efficient circuit design.
  • The use of interconnection layers and protective layers helps improve the reliability and performance of the device.

Benefits

  • The device offers improved connectivity and functionality due to the integration of cell and peripheral transistors.
  • The interlayer dielectric layer and blocking layer enhance the reliability and performance of the device.
  • The compact design of the device allows for space-saving in electronic devices.


Original Abstract Submitted

A semiconductor device including a substrate that includes a cell array region and a peripheral circuit region; a cell transistor on the cell array region of the substrate; a peripheral transistor on the peripheral circuit region of the substrate; a first interconnection layer connected to the cell transistor; a second interconnection layer connected to the peripheral transistor; an interlayer dielectric layer covering the first interconnection layer; and a blocking layer spaced apart from the first interconnection layer, the blocking layer covering a top surface and a sidewall of the second interconnection layer.