18095125. SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
Jump to navigation
Jump to search
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME
Organization Name
Inventor(s)
SANGJINE Park of Suwon-si (KR)
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18095125 titled 'SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME
Simplified Explanation
The abstract describes a method of processing a substrate by drying it using a combination of gas and supercritical fluid in a drying chamber.
- The substrate is placed in a drying chamber.
- A gas is supplied into the drying chamber.
- After the gas is supplied, a supercritical fluid is also supplied into the drying chamber.
- The combination of gas and supercritical fluid helps in the drying process of the substrate.
Potential Applications
- Semiconductor manufacturing: This method can be used to dry substrates during the production of semiconductors.
- Pharmaceutical industry: The drying process can be applied to pharmaceutical substrates to remove moisture and improve product stability.
- Food processing: The method can be used to dry food substrates, such as fruits or vegetables, to extend their shelf life.
Problems Solved
- Efficient drying: The combination of gas and supercritical fluid provides an efficient drying process for substrates.
- Moisture removal: The method effectively removes moisture from substrates, preventing damage or degradation.
- Uniform drying: The use of gas and supercritical fluid ensures uniform drying of the substrate, avoiding any unevenness.
Benefits
- Faster drying: The combination of gas and supercritical fluid speeds up the drying process, reducing overall processing time.
- Improved product quality: The efficient drying method helps maintain the quality and integrity of the substrate.
- Versatile application: The method can be applied to various industries and substrates, making it a versatile solution for drying processes.
Original Abstract Submitted
A method of processing a substrate includes disposing a substrate in a drying chamber, and supplying a fluid into the drying chamber in which the substrate is disposed. The supplying of the fluid into the drying chamber includes supplying a gas into the drying chamber, and supplying a supercritical fluid into the drying chamber after the supplying of the gas is started.
