18060830. SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SEMICONDUCTOR MEASUREMENT APPARATUS
Organization Name
Inventor(s)
Myungjun Lee of Seongnam-si (KR)
Jaehwang Jung of Suwon-si (KR)
SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18060830 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS
Simplified Explanation
The patent application describes a semiconductor measurement device that uses an illumination apparatus, an optical assembly, and a controller to determine the alignment state of patterns on a sample.
- The device includes an illumination apparatus with a polarizer to control the light output from a light source.
- An optical assembly includes an objective lens to focus the light passing through the polarizer onto the sample, and a beam splitter to capture the reflected light from the sample.
- The device also includes a controller that analyzes the images captured by two sensors to determine the alignment state of patterns on the sample.
- The first sensor includes an image sensor and a self-interference generator to enhance the accuracy of the captured image.
- The second sensor also includes an image sensor to capture a separate image of the sample.
Potential applications of this technology:
- Semiconductor manufacturing: This device can be used to accurately measure the alignment of patterns on semiconductor wafers during the manufacturing process.
- Quality control: The device can be used to ensure the alignment of patterns on various electronic components, such as integrated circuits, displays, and sensors.
Problems solved by this technology:
- Accurate alignment measurement: The device provides a reliable and precise method to determine the alignment state of patterns on a sample, which is crucial for semiconductor manufacturing and quality control.
- Enhanced image quality: The self-interference generator in the first sensor improves the quality of the captured image, allowing for more accurate alignment analysis.
Benefits of this technology:
- Improved manufacturing efficiency: Accurate alignment measurement helps optimize the manufacturing process and reduce errors, leading to higher production efficiency.
- Quality assurance: The device ensures that electronic components have proper pattern alignment, resulting in better product quality and reliability.
Original Abstract Submitted
A semiconductor measurement device may include an illumination apparatus having a polarizer on a propagation path of light output from a light source; an optical assembly including an objective lens configured to allow light passing through the polarizer to be incident on a sample and a beam splitter configured to transmit light reflected from the sample to first and second sensors; and a controller. The controller may be configured to determine an alignment state of patterns in a first region of the sample using a first original image output by the first sensor and an alignment state of patterns in a second region of the sample using a second original image output by the second sensor. The first sensor includes a first image sensor and a self-interference generator in a path along which light is incident on the first image sensor. The second sensor includes a second image sensor.
