18055959. ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
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Contents
- 1 ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Original Abstract Submitted
ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME
Organization Name
Inventor(s)
Myungwoong Kim of Incheon (KR)
Yoonhyun Kwak of Suwon-si (KR)
ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18055959 titled 'ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME
Simplified Explanation
The abstract of the patent application describes an acetal-based compound, prepolymer, polymer, and a photoresist composition that includes these compounds.
- The patent application is related to a specific acetal-based compound represented by Formula 1.
- The application also covers an acetal-based prepolymer and polymer.
- Additionally, the patent application includes a photoresist composition that incorporates the acetal-based compound, prepolymer, or polymer.
- The invention is focused on the development of these acetal-based compounds and their applications in photoresist compositions.
Potential Applications
The potential applications of this technology include:
- Photoresist materials for use in semiconductor manufacturing.
- Advanced lithography techniques in the production of microchips.
- High-resolution patterning in the fabrication of electronic devices.
Problems Solved
This technology addresses the following problems:
- The need for improved photoresist materials with enhanced performance and resolution capabilities.
- The demand for more efficient and precise lithography techniques in semiconductor manufacturing.
- The challenge of achieving high-resolution patterning in the production of electronic devices.
Benefits
The benefits of this technology are:
- Improved performance and resolution in photoresist materials.
- Enhanced lithography techniques leading to higher quality microchips.
- Increased precision and efficiency in the fabrication of electronic devices.
Original Abstract Submitted
An acetal-based compound represented by Formula 1, an acetal-based prepolymer, an acetal-based polymer, and a photoresist composition including the same
